Common mode compensation for non-linear polar material based differential memory bit-cell

ABSTRACT

To compensate switching of a dielectric component of a non-linear polar material based capacitor, an explicit dielectric capacitor is added to a memory bit-cell and controlled by a signal opposite to the signal driven on a plate-line.

CLAIM OF PRIORITY

This Application is a Continuation of, and claims the benefit ofpriority to, U.S. patent application Ser. No. 17/516,293, filed on Nov.1, 2021, and titled “Common Mode Compensation for Non-Linear PolarMaterial Based 1T1C Memory Bit-Cell,” which is incorporated by referencein its entirety for all purposes.

BACKGROUND

The standard memory used in processors is static random-access memory(SRAM) or dynamic random-access memory (DRAM), and their derivatives.These memories are volatile memories. For example, when power to thememories is turned off, the memories lose their stored data.Non-volatile memories are now commonly used in computing platforms toreplace magnetic hard disks. Non-volatile memories retain their storeddata for prolonged periods (e.g., months, years, or forever) even whenpower to those memories is turned off. Examples of non-volatile memoriesare magnetic random-access memory (MRAM), NAND, or NOR flash memories.These memories may not be suitable for low power and compact computingdevices because these memories suffer from high write energy, lowdensity, and high-power consumption.

The background description provided here is for the purpose of generallypresenting the context of the disclosure. Unless otherwise indicatedhere, the material described in this section is not prior art to theclaims in this application and are not admitted being prior art byinclusion in this section.

BRIEF DESCRIPTION OF THE DRAWINGS

The embodiments of the disclosure will be understood more fully from thedetailed description given below and from the accompanying drawings ofvarious embodiments of the disclosure, which, however, should not betaken to limit the disclosure to the specific embodiments, but are forexplanation and understanding only.

FIG. 1 illustrates a set of plots showing behavior of a ferroelectriccapacitor, a paraelectric capacitor, and a linear capacitor.

FIG. 2 illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes onetransistor and one capacitor (1T1C) and one compensation capacitor, inaccordance with some embodiments.

FIG. 3A illustrates a three-dimensional (3D) view of a 1T1C bit-cellwith common mode compensation, where the transistor is a planartransistor and where the capacitor is a planar capacitor, in accordancewith some embodiments.

FIG. 3B illustrates a 3D view of a 1T1C bit-cell with common modecompensation, where the transistor is a non-planar transistor and wherethe capacitor is a planar capacitor, in accordance with someembodiments.

FIG. 4 illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes threetransistors and one capacitor (3T1C) and one compensation capacitor, inaccordance with some embodiments.

FIG. 5A illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes onetransistors and multiple capacitors (1TnC) and one compensationcapacitor, in accordance with some embodiments.

FIG. 5B illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes onetransistors and multiple capacitors (1TnC), one compensation capacitor,and individual transistors for each of the multiple capacitors, inaccordance with some embodiments.

FIG. 6A illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes amulti-element gain memory bit-cell which includes one compensationcapacitor, in accordance with some embodiments.

FIG. 6B illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes amulti-element gain memory bit-cell which includes one compensationcapacitor and individual transistors for each of the multiple capacitorsof the multi-element gain bit-cell, in accordance with some embodiments.

FIG. 7A illustrates a cross-sectional view of 1TnC bit-cells withstacked planar non-linear polar material based capacitors and a planardielectric capacitor, in accordance with some embodiments.

FIG. 7B illustrates a cross-sectional view and possible structures ofthe planar non-linear polar material based capacitors used in FIG. 7A,in accordance with some embodiments.

FIG. 7C illustrates a cross-sectional view and possible structure of theplanar dielectric capacitor used in FIG. 7A, in accordance with someembodiments.

FIG. 8 illustrates a pillar FE capacitor including cross-sectional viewsand a 3D view, in accordance with some embodiments.

FIG. 9A illustrates a 3D view of a 1T1C bit-cell where the transistor isa planar transistor and where the capacitor is a non-planar capacitorwith non-linear polar material, and where the bit-cell includes acompensation capacitor, in accordance with some embodiments.

FIG. 9B illustrates a 3D view of a 1T1C bit-cell where the transistor isa non-planar transistor and where the capacitor is a non-planarcapacitor with non-linear polar material, and where the bit-cellincludes a compensation capacitor, in accordance with some embodiments.

FIG. 10 illustrates a cross-sectional view of 1TnC bit-cells withstacked non-planar non-linear polar material based capacitors and anon-planar dielectric capacitor, in accordance with some embodiments.

FIG. 11 illustrates a cross-sectional view of a non-planar dielectriccapacitor, in accordance with some embodiments.

FIG. 12A illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes 1T1C and one compensationcapacitor, in accordance with some embodiments.

FIG. 12B illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes three transistors and onecapacitor (3T1C) and one compensation capacitor, in accordance with someembodiments.

FIG. 13A illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes 1TnC and one compensationcapacitor, in accordance with some embodiments.

FIG. 13B illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes 1TnC and one compensationcapacitor, and individual transistors for each of the capacitors, inaccordance with some embodiments.

FIG. 14A illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes multi-element gain cells and onecompensation capacitor per cell, in accordance with some embodiments.

FIG. 14B illustrates an apparatus comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes multi-element gain cells and onecompensation capacitor per cell, and individual transistors for each ofthe capacitors, in accordance with some embodiments.

FIG. 15 illustrates a high-level architecture of an artificialintelligence (AI) machine comprising a compute die stacked with a memorydie, wherein the compute die includes any one of the memory bit-cells,in accordance with some embodiments.

FIG. 16 illustrates an architecture of a computational block comprisinga compute die stacked with a memory die, wherein the compute dieincludes any one of the memory bit-cells, in accordance with someembodiments.

FIG. 17 illustrates a system-on-chip (SOC) that uses any one of thememory bit-cells, in accordance with some embodiments.

DETAILED DESCRIPTION

Memory bit-cells comprising ferroelectric material provide a new classof non-volatile memories. However, such memories suffer from chargedegradation over time, for example, during read operations. Suchmemories also suffer from charge disturbance when neighboring bit-cellcells are accessed. Such disturbance may be a function routingconfiguration of plate-line(s), relative to bit-lines and word-lines.Further, leakage from transistors coupled to ferroelectric capacitor(s)may further degrade charge on a storage node connected to the capacitor.

When a plate-line coupled to the ferroelectric capacitor is pulsed, theferroelectric capacitor switches. In this case the equivalent dielectriccomponent of the ferroelectric capacitance also switches. To compensatefor the switching of the equivalent dielectric component, an explicitdielectric capacitor is added and controlled by a signal opposite to thesignal driven on the plate-line.

The equivalent dielectric component of the ferroelectric capacitor canbecome a non-negligible factor for pillar capacitor or non-planarcapacitor topologies. This may be because as polarization densityassociated with a ferroelectric capacitor at lower thickness reduces,the lower thickness increases the dielectric component of theferroelectric capacitor. This in turn indicates that at a sense-line(e.g., a bit-line) while performing a read, a large chunk of common modesignal contribution (where common mode has the same value whether logic1 or 0 is read) is associated with the switching of the equivalentdielectric component. When operating the memory at different supplyvoltages, the dielectric component of the ferroelectric capacitor causesa supply voltage dependent signal on the sense-line (e.g., bit-line).Since there is a non-differential topology for sensing, this causes lossof margin, unless reference voltage is not raised to compensate forsupply voltage change. For a multi-element gain based memory bit-celltopologies, the same voltage also acts as a disturbance to the otherferroelectric capacitors in the bit-cell, since any movement on thecommon node shared by the multiple elements creates a field that affectsother capacitors of the bit-cell. Minimizing the common mode signal byapplying an opposite field in proportion to the equivalent dielectriccomponent of the ferroelectric capacitor would negate loss of read orwrite margin. The explicit linear dielectric capacitor of someembodiments mitigates the effect of this supply voltage dependentsignal.

In some embodiments, the memory bit-cell comprises a first capacitorcomprising non-linear polar material coupled to a node. The firstcapacitor has a first terminal coupled to the node and a second terminalcoupled to a first plate-line. In some embodiments, the memory bit-cellcomprises a transistor coupled to the node and a bit-line, wherein thetransistor is controllable by a word-line, and wherein the firstplate-line is parallel to the bit-line. In some embodiments, the memorybit-cell comprises a second capacitor coupled to the node and a secondplate-line, wherein the second capacitor comprises a linear dielectric.The second capacitor is used for common mode compensation. In someembodiments, the effective capacitance of the second capacitor is equal(or substantially) to a linear component of the capacitance of the firstcapacitor. In various embodiments, one or more circuitries are providedto apply a voltage on the second plate-line. The voltage on the secondplate-line is opposite to a voltage applied to the first capacitor viathe first plate-line to compensate for dielectric capacitor dependentcharge. In some embodiments, the second plate-line has a voltagecomplementary to a voltage on the first plate-line. In some embodiments,the first capacitor is a pillar capacitor. In some embodiments, thefirst capacitor and the second capacitor are vertically stacked. Assuch, the x-y footprint of the bit-cell does not change. The expressdielectric capacitor (also referred to as the compensation capacitor)can also be included in other memory bit-cell configurations such as1TnC and multi-element gain based memory bit-cell.

In the following description, numerous details are discussed to providea more thorough explanation of embodiments of the present disclosure. Itwill be apparent, however, to one skilled in the art, that embodimentsof the present disclosure may be practiced without these specificdetails. In other instances, well-known structures and devices are shownin block diagram form, rather than in detail, to avoid obscuringembodiments of the present disclosure.

Note that in the corresponding drawings of the embodiments, signals arerepresented with lines. Some lines may be thicker, to indicate moreconstituent signal paths, and/or have arrows at one or more ends, toindicate primary information flow direction. Such indications are notintended to be limiting. Rather, the lines are used in connection withone or more exemplary embodiments to facilitate easier understanding ofa circuit or a logical unit. Any represented signal, as dictated bydesign needs or preferences, may actually comprise one or more signalsthat may travel in either direction, and may be implemented with anysuitable type of signal scheme.

It is pointed out that those elements of the figures having the samereference numbers (or names) as the elements of any other figure canoperate or function in any manner like that described but are notlimited to such.

FIG. 1 illustrates a set of plots 100 and 120 showing behavior of aferroelectric capacitor, a paraelectric capacitor, and a linearcapacitor. Plot 100 compares the transfer function for a linearcapacitor, a paraelectric (PE) capacitor (a non-linear capacitor) and aferroelectric (FE) capacitor (a non-linear capacitor). Here, x-axis isinput voltage or voltage across the capacitor, while the y-axis is thecharge on the capacitor. The ferroelectric material can be any suitablelow voltage FE material that allows the FE material to switch its stateby a low voltage (e.g., 100 mV). Threshold in the FE material has ahighly non-linear transfer function in the polarization vs. voltageresponse. The threshold is related to: a) non-linearity of switchingtransfer function; and b) the squareness of the FE switching. Thenon-linearity of switching transfer function is the width of thederivative of the polarization vs. voltage plot. The squareness isdefined by the ratio of the remnant polarization to the saturationpolarization, perfect squareness will show a value of 1. The squarenessof the FE switching can be suitably manipulated with chemicalsubstitution. For example, in PbTiO3 a P-E (polarization-electric field)square loop can be modified by La or Nb substitution to create anS-shaped loop. The shape can be systematically tuned to ultimately yielda non-linear dielectric. The squareness of the FE switching can also bechanged by the granularity of an FE layer. A perfectly epitaxial, singlecrystalline FE layer will show higher squareness (e.g., ratio is closerto 1) compared to a poly crystalline FE. This perfect epitaxial can beaccomplished using lattice matched bottom and top electrodes. In oneexample, BiFeO (BFO) can be epitaxially synthesized using a latticematched SrRuO3 bottom electrode yielding P-E loops that are square.Progressive doping with La will reduce the squareness.

Plot 120 shows the charge and voltage relationship for a ferroelectriccapacitor. A capacitor with ferroelectric material (also referred to asa FEC) is a non-linear capacitor with its potential V_(F)(Q_(F)) as acubic function of its charge. Plot 120 illustrates characteristics of anFEC. Plot 120 is a charge-voltage (Q-V) plot for a block ofPb(Zr_(0.5)Ti_(0.5))O₃ of area (100 nm)² and thickness 30 nm(nanometer). Plot 120 shows local extrema at +/−V_(o) indicated by thedashed lines. Here, the term V_(c) is the coercive voltage. In applyinga potential V across the FEC, its charge can be unambiguously determinedonly for |V|>V_(o). Otherwise, the charge of the FEC is subject tohysteresis effects.

FIG. 2 illustrates apparatus 200 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes onetransistor and one capacitor (1T1C) and one compensation capacitor, inaccordance with some embodiments. While various embodiments areillustrated with reference to ferroelectric material and/orferroelectric capacitor, the embodiments are applicable to othernon-linear polar material such as paraelectric material, non-lineardielectric, etc.

Apparatus 200 comprises M×N memory array 201 of bit-cells 201 _(0,0)through 201 _(M,N), logic circuitry 202 for address decoding, logic 203having sense amplifier and write drivers, PL driver, and PLB driver, andWL repeaters 205. In some embodiments, bit-cell 201 _(0,0) comprises aWL, a first PL, a second PL (herein PLB), which carries a signal inverseof the signal on the first PL, and a BL. In some embodiments, bit-cell201 _(0,0) comprises an n-type transistor MN₁, and FE capacitivestructure Cfe₁. The gates of transistor MN₁ are coupled to a common WL.In various embodiments, one terminal of the FE capacitive structure Cfe₁is coupled to the first PL. The second terminal of the FE capacitivestructure is coupled to source or drain terminal of the transistor MN₁.In various embodiments, BL is coupled to the source or drain terminal offirst transistor MN₁. In some embodiments, the PL is parallel to the BLand orthogonal to the WL. In some embodiments, the FE capacitor is aplanar capacitor. In some embodiments, the FE capacitor is a pillar ornon-planar capacitor.

Logic 202 comprises address decoders for selecting a row of bit-cellsand/or a particular bit-cell from M×N array 201, where M and N areintegers of same or different values. In some embodiments, logic 202includes word-line drivers. In some embodiments, logic 203 comprisessense-amplifiers for reading the values from the selected bit-cell.Since the PL is parallel to the BL, in some embodiments, PL drivers(e.g., PL driver and PLB drivers) and BL drivers are part of logic 203.In other embodiments, PL drivers and BL drivers may be placed acrosslogic 203 on the other side of memory array 201. In various embodiments,write drivers are used to write a particular value to a selectedbit-cell. Here, a schematic of FE bit-cell 201 _(0,0) is illustrated.The same embodiments apply to other bit-cells of the M×N array. As thePL and PLB are parallel to the bit-line, the WL drivers can be placedorthogonal to the region where the plate-line drivers and bit-linedrivers are placed. In some embodiments, WL repeaters 205 are added tobuffer the word-line signals along different memory arrays. In someembodiments, apparatus 200 comprises a wear-leveling logic (alsoreferred to as refresh logic) to refresh the contents of the memorybit-cells periodically or on a need-by-need basis.

In some embodiments, memory bit-cell 201 (e.g., 201 _(0,0)) comprises asecond capacitor Cd coupled to the source or drain of MN₁ and the secondplate-line PLB. In some embodiments, the second capacitor Cd comprises alinear dielectric. In some embodiments, the second capacitor Cd is usedfor common mode compensation. In some embodiments, the effectivecapacitance of the second capacitor Cd is equal (or substantially equal)to a linear component of the capacitance of the first capacitor Cfe1.

In various embodiments, one or more circuitries are provided to apply avoltage on the second plate-line PLB. The voltage on the secondplate-line PLB is opposite to a voltage applied to the first capacitorCfe1 via the first plate-line PL to compensate for dielectric capacitordependent charge. In some embodiments, the second plate-line PLB has avoltage complementary to a voltage on the first plate-line PL. In someembodiments, the first capacitor is a pillar capacitor. In someembodiments, the second capacitor Cd is a pillar capacitor. In someembodiments, the first capacitor Cfe and the second capacitor Cd arevertically stacked. As such, the x-y footprint of the bit-cell does notchange compared to bit-cell 201. The express dielectric capacitor Cd(also referred to as the compensation capacitor) can also be included inother memory bit-cell configurations such as 1TnC and multi-element gainbased memory bit-cell.

While the embodiment of FIG. 2 is illustrated with reference to PL andPLB being parallel to BL, the common mode compensation scheme usingdielectric capacitor Cd is also applicable to bit-cells with PL and PLBparallel to the WL. Likewise, while the embodiments are described withreference to pillar capacitors, both the first and second capacitors canbe planar capacitors, in accordance with some embodiments.

FIG. 3A illustrates a three-dimensional (3D) view of a 1T1C bit-cell 300with common mode compensation, where the transistor is a planartransistor and where the capacitor is a planar capacitor, in accordancewith some embodiments. In some embodiments, memory bit-cell 300 includesa planar transistor MN (e.g., transistor MN₁) having substrate 301,source region 302, drain region 303, channel region 304, gate comprisinggate dielectric 305, gate spacers 306 a and 306 b; gate metal 307,source contact 308 a, and drain contact 308 b. In some embodiments,substrate 301 includes a suitable semiconductor material such as: singlecrystal silicon, polycrystalline silicon and silicon on insulator (SOI).In some embodiments, substrate 301 includes other semiconductormaterials such as: Si, Ge, SiGe, or a suitable group III-V or groupIII-N compound. In some embodiments, substrate 301 may also includesemiconductor materials, metals, dopants, and other materials commonlyfound in semiconductor substrates.

In some embodiments, source region 302 and drain region 303 are formedwithin substrate 301 adjacent to the gate stack of the transistor. Invarious embodiments, source region 302 and drain region 303 aregenerally formed using either an etching/deposition process or animplantation/diffusion process. In some embodiments, in the etching anddeposition process, substrate 301 may first be etched to form recessesat the locations of the source 302 and drain 303 regions. An epitaxialdeposition process may then be carried out to fill the recesses withmaterial that is used to fabricate the source region 302 and drainregion 303. In the implantation/diffusion process, dopants such asboron, aluminum, antimony, phosphorous, or arsenic may be ion-implantedinto the substrate to form the source region 302 and drain region 303.An annealing process that activates the dopants and causes them todiffuse further into substrate 301 typically follows theion-implantation process. In some embodiments, one or more layers ofmetal and/or metal alloys are used to form source region 302 and drainregion 303. In some embodiments, source region 302 and drain region 303are formed using one or more alternate semiconductor materials such asgermanium or a suitable group III-V compound. In some embodiments,source region 302 and drain region 303 are fabricated using a siliconalloy such as silicon germanium or silicon carbide. In some embodiments,the epitaxially deposited silicon alloy is doped in-situ with dopantssuch as boron, arsenic, or phosphorous. In some embodiments,semiconductor material for channel region 304 may have the same materialas substrate 301, in accordance with some embodiments. In someembodiments, channel region 304 includes one of: Si, SiGe, Ge, or GaAs.

In some embodiments, gate dielectric layer 305 may include one layer ora stack of layers. The one or more layers may include high-k dielectricmaterial, silicon oxide, and/or silicon dioxide (SiO₂). The high-kdielectric material may include elements such as: zinc, niobium,scandium, lean yttrium, hafnium, silicon, strontium, oxygen, barium,titanium, zirconium, tantalum, aluminum, and lanthanum. Examples ofhigh-k materials that may be used in the gate dielectric layer include:lead zinc niobate, hafnium oxide, lead scandium tantalum oxide, hafniumsilicon oxide, yttrium oxide, aluminum oxide, lanthanum oxide, bariumstrontium titanium oxide, lanthanum aluminum oxide, titanium oxide,zirconium oxide, tantalum oxide, and zirconium silicon oxide. In someembodiments, when a high-k material is used, an annealing process isused on the gate dielectric layer 305 to improve its quality.

In some embodiments, a pair of spacer layers (sidewall spacers) 306 a/bare formed on opposing sides of the gate stack that brackets the gatestack. The pair of spacer layers 306 a/b are formed from a material suchas: silicon oxy-nitride, silicon nitride, silicon nitride doped withcarbon, or silicon carbide. Processes for forming sidewall spacers arewell-known in the art and generally include deposition and etchingprocess operations. In some embodiments, a plurality of spacer pairs maybe used. For example, two pairs, three pairs, or four pairs of sidewallspacers may be formed on opposing sides of the gate stack.

In some embodiments, depending on whether the transistor is to be ap-type or an n-type transistor, gate metal layer 307 may comprise atleast one P-type work-function metal or N-type work-function metal. Insome embodiments, gate metal layer 307 may comprise a stack of two ormore metal layers. In some embodiments, the two or more metal layers arework-function metal layers and at least one metal layer is a conductivefill layer. In some embodiments, for an n-type transistor, metals thatmay be used for the gate metal layer 307 include: aluminum carbide,tantalum carbide, zirconium carbide, and/or hafnium carbide. In someembodiments, metal for gate metal layer 307 for n-type transistorinclude: aluminum, hafnium, zirconium, titanium, tantalum, and theiralloys. An n-type metal layer may enable the formation of an n-type gatemetal layer 307 with a work function that is between about 3.9 eV andabout 4.2 eV. In some embodiments, metal of layer 307 includes one of:TiN, TiSiN, TaN, Cu, Al, Au, W, TiSiN, and/or Co. In some embodiments,metal of layer 307 includes one or more of: Ti, N, Si, Ta, Cu, Al, Au,W, or Co. In some embodiments, for a p-type transistor, metals that areused for gate metal layer 307 include, but are not limited to,ruthenium, palladium, platinum, cobalt, nickel, and conductive metaloxides. An example of conductive oxide includes ruthenium oxide. Ap-type metal layer may enable the formation of a p-type gate metal layer307 with a work function that is between about 4.9 eV and about 5.2 eV.

In some embodiments, drain contact 308 b is coupled to via 309 a/b,which is coupled to metal layer for BL 310. Metal layer for BL 310 isthe bit-line, which extends along the y-axis. In some embodiments,source contact 308 a is coupled to via 309 b. Any suitable material canbe used for drain and source contacts 308 a/b and via 309 a/b. Forexample, one or more of Ti, N, Si, Ta, Cu, Al, Au, W, and/or Co can beused for drain and source contacts 308 a/b and via 309 a/b. In someembodiments, via 309 b is coupled to FE capacitor Cfe.

The capacitor Cfe can be any planar capacitor. Three such examples areshown as Cfe-1, Cfe-2, and Cfe-3. In some embodiments, the planarcapacitor Cfe-2 incudes encapsulation portions 321 c and 321 d that arepartially adjacent to sidewall barrier seal 321 a and 321 b, andrefractive inter-metallic layers 311 a. In various embodiments,encapsulation portions 321 c and 321 d terminate into via 309 a. Thematerial for encapsulation portions 321 c and 321 d is same as those forsidewall barrier seal 321 a and 321 b. In some embodiments, the planarcapacitor Cfe-3 includes encapsulation portions 321 e and 321 f that arepartially adjacent to sidewall barrier seal 321 a and 321 b, andrefractive inter-metallic layers 311 b. In various embodiments,encapsulation portions 321 e and 321 f terminate into via 309 b. Thematerial for encapsulation portions 321 e and 321 f is same as those forsidewall barrier seal 321 a and 321 b.

In some embodiments, the capacitor Cfe comprises a number of layersstacked together to form a planar capacitor. These layers may beextending in an x-plane when the capacitor is a planar capacitor. Insome embodiments, the stack of layers includes refractive inter-metallic311 a/b as a barrier material; conductive oxides 312 a/b, and FEmaterial 313. In some embodiments, refractive inter-metallic 311 a/b areremoved and vias 309 a/b are in direct contact with conductive oxides312 a/b.

In some embodiments, refractive inter-metallic 311 a/b maintains the FEproperties of the FE capacitor Cfe. In the absence of refractiveinter-metallic 311 a/b, the ferroelectric material or the paraelectricmaterial 313 of the capacitor may lose its potency. In some embodiments,refractive inter-metallic 311 a/b comprises Ti and Al (e.g., TiAlcompound). In some embodiments, refractive inter-metallic 311 a/bcomprises one or more of Ta, W, and/or Co. For example, refractiveinter-metallic 311 a/b includes a lattice of Ta, W, and Co. In someembodiments, refractive inter-metallic 311 a/b includes one of: Ti—Alsuch as Ti3Al, TiAl, TiAl3; Ni—Al such as Ni3Al, NiAl3, NiAl; Ni—Ti,Ni—Ga, Ni2MnGa; FeGa, Fe3Ga; borides, carbides, or nitrides. In someembodiments, TiAl material comprises Ti-(45-48)Al-(1-10)M (at. X traceamount %), with M being at least one element from: V, Cr, Mn, Nb, Ta, W,and Mo, and with trace amounts of 0.1-5% of Si, B, and/or Mg. In someembodiments, TiAl is a single-phase alloy γ(TiAl). In some embodiments,TiAl is a two-phase alloy γ(TiAl)+α2(Ti3Al). Single-phase γ alloyscontain third alloying elements such as Nb or Ta that promotestrengthening and additionally enhance oxidation resistance. The role ofthe third alloying elements in the two-phase alloys is to raiseductility (V, Cr, Mn), oxidation resistance (Nb, Ta) or combinedproperties. Additions such as Si, B and Mg can markedly enhance otherproperties. In some embodiments, barrier layer 311 a is coupled toplate-line or powerline (PL) 315. In some embodiments, sidewall barrierseal 321 a/b (insulating material) is placed around layers 311 a, 312 a,313, 312 b, and 311 b along while the top and bottom surfaces of 311 aand 311 b are exposed for coupling to metal layers, vias, or a metallicpedestal.

In some embodiments, PL 315 extends along the y-direction and parallelto the BL 310. PL 315 and BL 310 can also be parallel along anx-direction. Here, y-direction is provided as an example and theparallel orientation can be along the x-direction too. Having the BL andthe PL parallel to one another further improves the density of thememory because the memory array footprint is reduced, allowing columnmultiplexing (muxing), and sharing of sense-amplifier, and PL linedriver size reduction, compared to the case when BL and PL areorthogonal to each other. In some embodiments, gate metal 307 is coupledto a gate contact 316, which is coupled to metal line 317. Metal line317 is used as the word-line (WL). In some embodiments, WL 317 extendsorthogonal to BL 310 and PL 315. In some embodiments, WL 317 is alsoparallel to BL 310 and PL 315. Any suitable metal can be used for BL310, PL 315, and/or WL 317. For example, Al, Cu, Co, Au, or Ag can beused for BL 310, PL 315, and WL 317.

In various embodiments, FE material 313 can be any suitable low voltageFE material that allows the FE material to switch its state by a lowvoltage (e.g., 100 mV). In various embodiments, FE material 313 can beany suitable low voltage FE material that allows FE material 313 toswitch its state by a low voltage (e.g., 100 mV). Threshold in FEmaterial has a highly non-linear transfer function in the polarizationvs. voltage response. The threshold is related to: a) non-linearity ofswitching transfer function; and b) the squareness of the FE switching.The non-linearity of switching transfer function is the width of thederivative of the polarization vs. voltage plot. The squareness isdefined by the ratio of the remnant polarization to the saturationpolarization; perfect squareness will show a value of 1.

The squareness of the FE switching can be suitably manipulated withchemical substitution. For example, in PbTiO3 a P-E(polarization-electric field) square loop can be modified by La or Nbsubstitution to create an S-shaped loop. The shape can be systematicallytuned to ultimately yield a non-linear dielectric. The squareness of theFE switching can also be changed by the granularity of an FE layer. Aperfectly epitaxial, single crystalline FE layer will show highersquareness (e.g., ratio is closer to 1) compared to a poly crystallineFE. This perfect epitaxial can be accomplished using lattice matchedbottom and top electrodes. In one example, BiFeO (BFO) can beepitaxially synthesized using a lattice matched SrRuO3 bottom electrodeyielding P-E loops that are square. Progressive doping with La willreduce the squareness.

In some embodiments, FE material 313 comprises a perovskite of the typeABO₃, where ‘A’ and ‘B’ are two cations of different sizes, and ‘O’ isoxygen which is an anion that bonds to both the cations. Generally, thesize of atoms of A is larger than the size of B atoms. In someembodiments, the perovskite can be doped (e.g., by La or Lanthanides).

In some embodiments, FE material 313 is perovskite, which includes oneor more of: La, Sr, Co, Sr, Ru, Y, Ba, Cu, Bi, Ca, and Ni. For example,metallic perovskites such as: (La,Sr)CoO₃, SrRuO₃, (La,Sr)MnO₃,YBa₂Cu₃O₇, Bi₂Sr₂CaCu₂O₈, LaNiO₃, BaTiO₃, KNbO₃, NaTaO₃, etc. may beused for FE material. Perovskites can be suitably doped to achieve aspontaneous distortion in a range of 0.3 to 2%. For example, forchemically substituted lead titanate such as Zr in Ti site; La, Nb in Tisite, the concentration of these substitutes is such that it achievesthe spontaneous distortion in the range of 0.3-2%. For chemicallysubstituted BiFeO3, BrCrO3, BuCoO3 class of materials, La or rare earthsubstitution into the Bi site can tune the spontaneous distortion. Insome embodiments, FE material is contacted with a conductive metal oxidethat includes one of the conducting perovskite metallic oxidesexemplified by: La—Sr—CoO3, SrRuO3, La—Sr—MnO3, YBa2Cu3O7,Bi2Sr2CaCu2O8, and LaNiO3.

In some embodiments, FE material 313 comprises a stack of layersincluding low voltage FE material between (or sandwiched between)conductive oxides. In various embodiments, when FE material is aperovskite, the conductive oxides are of the type AA′BB′O₃. A′ is adopant for atomic site A, it can be an element from the Lanthanidesseries. B′ is a dopant for atomic site B, it can be an element from thetransition metal elements, especially Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu,Zn. A′ may have the same valency of site A, with a differentferroelectric polarizability. In various embodiments, when metallicperovskite is used for FE material 313, conductive oxides can includeone or more of: IrO₂, RuO₂, PdO₂, OsO₂, or ReO₃. In some embodiments,the perovskite is doped with La or Lanthanides. In some embodiments,thin layer (e.g., approximately 10 nm) perovskite template conductorssuch as SrRuO3 coated on top of IrO2, RuO2, PdO2, PtO2, which have anon-perovskite structure but higher conductivity to provide a seed ortemplate for the growth of pure perovskite ferroelectric at lowtemperatures, are used as conductive oxides.

In some embodiments, ferroelectric materials are doped with s-orbitalmaterial (e.g., materials for first period, second period, and ionicthird and fourth periods). In some embodiments, f-orbital materials(e.g., lanthanides) are doped to the ferroelectric material to makeparaelectric material. Examples of room temperature paraelectricmaterials include: SrTiO3, Ba(x)Sr(y)TiO3 (where x is −0.05 or 0.5, andy is 0.95), HfZrO2, Hf—Si—O, La-substituted PbTiO3, PMN-PT based relaxorferroelectrics.

In some embodiments, FE material 313 comprises one or more of: Hafnium(Hf), Zirconium (Zr), Aluminum (Al), Silicon (Si), their oxides or theiralloyed oxides. In some embodiments, FE material includes one or moreof: Al(1-x)Sc(x)N, Ga(1-x)Sc(x)N, Al(1-x)Y(x)N or Al(1-x-y)Mg(x)Nb(y)N,y doped HfO2, where x includes one of: Al, Ca, Ce, Dy, Er, Gd, Ge, La,Sc, Si, Sr, Sn, or Y, wherein ‘x’ is a fraction. In some embodiments, FEmaterial includes one or more of: Bismuth ferrite (BFO), lead zirconatetitanate (PZT), BFO with doping material, or PZT with doping material,wherein the doping material is one of Nb or La; and relaxorferroelectrics such as PMN-PT.

In some embodiments, FE material 313 includes Bismuth ferrite (BFO) witha doping material where in the doping material is one of Lanthanum, orany element from the lanthanide series of the periodic table. In someembodiments, FE material includes lead zirconium titanate (PZT), or PZTwith a doping material, wherein the doping material is one of La, Nb. Insome embodiments, FE material includes a relaxor ferro-electric includesone of lead magnesium niobate (PMN), lead magnesium niobate-leadtitanate (PMN-PT), lead lanthanum zirconate titanate (PLZT), leadscandium niobate (PSN), Barium Titanium-Bismuth Zinc Niobium Tantalum(BT-BZNT), Barium Titanium-Barium Strontium Titanium (BT-BST).

In some embodiments, FE material 313 includes Hafnium oxides of theform, Hf1-x Ex Oy where E can be Al, Ca, Ce, Dy, er, Gd, Ge, La, Sc, Si,Sr, Sn, or Y. In some embodiments, FE material includes Niobate typecompounds LiNbO3, LiTaO3, Lithium iron Tantalum Oxy Fluoride, BariumStrontium Niobate, Sodium Barium Niobate, or Potassium strontiumniobate.

In some embodiments, FE material 313 comprises multiple layers. Forexample, alternating layers of [Bi2O2]2+, and pseudo-perovskite blocks(Bi4Ti3O12 and related Aurivillius phases), with perovskite layers thatare ‘n’ octahedral layers in thickness can be used. In some embodiments,FE material comprises organic material. For example, Polyvinylidenefluoride or polyvinylidene difluoride (PVDF).

In some embodiments, FE material 313 comprises hexagonal ferroelectricsof the type h-RMnO3, where R is a rare earth element viz. cerium (Ce),dysprosium (Dy), erbium (Er), europium (Eu), gadolinium (Gd), holmium(Ho), lanthanum (La), lutetium (Lu), neodymium (Nd), praseodymium (Pr),promethium (Pm), samarium (Sm), scandium (Sc), terbium (Tb), thulium(Tm), ytterbium (Yb), and yttrium (Y). The ferroelectric phase ischaracterized by a buckling of the layered MnO5 polyhedra, accompaniedby displacements of the Y ions, which lead to a net electricpolarization. In some embodiments, hexagonal FE includes one of: YMnO3or LuFeO3. In various embodiments, when FE material comprises hexagonalferroelectrics, the conductive oxides are of A2O3 (e.g., In2O3, Fe2O3)and ABO3 type, where ‘A’ is a rare earth element and B is Mn.

In some embodiments, FE material 313 comprises improper FE material. Animproper ferroelectric is a ferroelectric where the primary orderparameter is an order mechanism such as strain or buckling of the atomicorder. Examples of improper FE material are LuFeO3 class of materials orsuper lattice of ferroelectric and paraelectric materials PbTiO3 (PTO)and SnTiO3 (STO), respectively, and LaAlO3 (LAO) and STO, respectively.For example, a super lattice of [PTO/STO]n or [LAO/STO]n, where ‘n’ isbetween 1 to 100. While various embodiments here are described withreference to ferroelectric material for storing the charge state, theembodiments are also applicable for paraelectric material. For example,the capacitor of various embodiments can be formed using paraelectricmaterial instead of ferroelectric material.

While various embodiments here are described with reference toferroelectric material for storing the charge state, the embodiments arealso applicable for paraelectric material. For example, non-linearparaelectric material of various embodiments can be formed usingparaelectric material instead of ferroelectric material. In someembodiments, paraelectric material includes one of: SrTiO3,Ba(x)Sr(y)TiO3 (where x is −0.5, and y is 0.95), HfZrO2, Hf—Si—O,La-substituted PbTiO3, or PMN-PT based relaxor ferroelectrics.

While various embodiments here are described with reference toferroelectric material for storing the charge state, the embodiments arealso applicable for paraelectric material. For example, FE material 313of various embodiments can be formed using paraelectric material insteadof ferroelectric material. In some embodiments, paraelectric materialincludes one of: SrTiO3, Ba(x)Sr(y)TiO3 (where x is −0.5, and y is0.95), HfZrO2, Hf—Si—O, La-substituted PbTiO3, or PMN-PT based relaxorferroelectrics.

The capacitor Cfe can be any planar capacitor. Three such examples areshown as Cfe-1, Cfe-2, and Cfe-3. In some embodiments, the planarcapacitor Cfe-2 includes encapsulation portions 321 c and 321 d that arepartially adjacent to sidewall barrier seal 321 a and 321 b, andrefractive inter-metallic layers 311 a. In various embodiments,encapsulation portions 321 c and 321 d terminate into via 309 a. Thematerial for encapsulation portions 321 c and 321 d is same as those forsidewall barrier seal 321 a and 321 b. In some embodiments, the planarcapacitor Cfe-3 includes encapsulation portions 321 e and 321 f that arepartially adjacent to sidewall barrier seal 321 a and 321 b, andrefractive inter-metallic layers 311 b. In various embodiments,encapsulation portions 321 e and 321 f terminate into via 309 b. Thematerial for encapsulation portions 321 e and 321 f is same as those forsidewall barrier seal 321 a and 321 b.

In some embodiments, thickness t₃₁₁ of refractive inter-metallic layer311 a/b is in a range of 1 nm to 30 nm. In some embodiments, thicknesst₃₁₂ of the conductive oxide layers 312 a/b is in a range of 1 nm to 30nm. In some embodiments, thickness t₃₁₃ of the FE material (e.g.,perovskite, hexagonal ferroelectric, or improper ferroelectric) 313 a/bis in a range of 1 nm to 30 nm. In some embodiments, the lateralthickness t₃₂₁ of the sidewall barrier seal 321 a/b (insulatingmaterial) is in a range of 0.1 nm to 40 nm. In some embodiments, thelateral thickness L_(Cfe) of the capacitive structure (without sidewallbarrier) is in a range of 5 nm to 200 nm. In some embodiments, theheight H_(Cfe) of the capacitive structure is in a range of 10 nm to 200nm. In some embodiments, the FE capacitive structure is withoutrefractive inter-metallic layers 311 a/b. In that case, conductiveoxides layers 312 a/b are in direct contact with the contacts, vias, ormetals (e.g., PL, source/drain region contact of transistor MN). In someembodiments, sidewall barrier seal 321 a/b is not present. In one suchembodiment, the sidewalls of the layers 311 a/b, 312 a/b, and 313 are indirect contact with ILD (interlayer dielectric) such as SiO2.

In the absence of capacitor Cd, when PL 315 coupled to the capacitor Cfeis pulsed, the capacitor Cfe also switches. In this case the dielectriccomponent of the non-linear polar material based capacitance alsoswitches. In some embodiments, to compensate the switching of thedielectric component, an explicit dielectric capacitor Cd is added andcontrolled by PLB 325. The signal on PLB 325 is opposite to the signaldriven on PL 315, in accordance with various embodiments. In someembodiments, dielectric capacitor Cd comprises a top electrode 322 a,dielectric layer 323, and bottom electrode 322 b. In some embodiments,top electrode 322 a is coupled to PLB 325. In some embodiments, PLB 325is parallel to PL 315. In this example, top electrode 322 a is directlyconnected to PLB 325. In some embodiments, bottom electrode 322 b iscoupled to contact 308 b. In this example, bottom electrode 322 b isdirectly connected to bottom electrode 322 b. Any suitable conductivematerial may be used for top electrode 322 a and bottom electrode 322 b.For example, the material or the electrode may include one or more of:Cu, Al, Ag, Au, W, or Co. In some embodiments, additional layers may beformed between top electrode 322 a and bottom electrode 322 b. Forexample, conductive oxide layers (such as 311 a and 311 b) may be formedon the top and bottom of dielectric layer 323. In some embodiments,dielectric layer 323 includes one or more of: SIO2, Al2O3, Li2O, HfSiO4,Sc2O3, SrO, HfO2, ZrO2, Y2O3, Ta2O₅, BaO, WO3, MoO3, or TiO2. In someembodiments, the thickness t₃₂₂ of top electrode 322 a and bottomelectrode is in a range of 1 nm to 30 nm. In some embodiments, thethickness t₃₂₃ of dielectric 323 is in a range of 1 nm to 30 nm. In someembodiments, capacitor Cd is stacked over capacitor Cfe to reduce thex-y footprint of the memory bit-cell.

While capacitor Cd is illustrated as a metal-insulator-metal planarcapacitor, it can be replaced with other types of capacitors. Forexample, in some embodiments, capacitance of Cd is achieved by atransistor (not shown) configured as a capacitor. In one such example,the gate of the transistor is coupled to PLB 325 while the source anddrains of that transistor are coupled to contact 308 a.

FIG. 3B illustrates a 3D view 320 of a 1T1C bit-cell with common modecompensation, where the transistor is a non-planar transistor and wherethe capacitor is a planar capacitor, in accordance with someembodiments. FinFET is an example of a non-planar transistor. FinFETcomprises a fin that includes source 342 and drain 343 regions. Achannel resides between the source and regions 342 and 343. Thetransistor MN can have multiple fins parallel to one another that arecoupled to the same gate stack. The fins pass through the gate stackforming source and drain regions 342 and 343. Other examples ofnon-planar transistors include nano-wire transistors or nano-sheettransistors.

FIG. 4 illustrates apparatus 400 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes threetransistors and one capacitor (3T1C) and one compensation capacitor, inaccordance with some embodiments. Apparatus 400 is similar to apparatus200 of FIG. 2 but for a different kind of memory bit-cell. In someembodiments, each memory bit-cell 401 _(0,0) in memory array 401 isorganized in rows and columns like in apparatus 200. For example, memorybit-cells 401 _(0,0) through 401 _(M,N) are organized in an array. Insome embodiments, memory bit-cell 401 _(0,0) comprises three transistorsMN₁, MN₂, and MN₃, and one capacitor Cfe1 comprising non-linear polarmaterial. Capacitor Cfe1 can be a planar or non-planar capacitor asdescribed with reference to various embodiments. While the embodimentsare described with reference to memory bit-cell 401 _(0,0), they areapplicable to other bit-cells of array 401.

The gate terminals of transistors MN₁, MN₂, and MN₃ are controllable byWL. In some embodiments, BL is coupled to a source or drain terminal oftransistor MN₁. In some embodiments, PL is coupled to source or drainterminal of MN₂. In some embodiments, the drain or source terminal ofMN₂ is coupled to capacitor Cfe1 having non-linear polar material. Insome embodiments, PLB is coupled to source or drain terminal of MN₃. Insome embodiments, the drain or source terminal of MN₃ is coupled tolinear capacitor Cd having linear dielectric material.

While the various embodiments are illustrated with reference to n-typetransistors, the embodiments are also applicable to p-type transistorsor a combination of n-type or p-type transistors. A person skilled inthe art would appreciate that when transistors of different conductivitytype are used, than what is shown in FIG. 4 , then driving logic for BL,PL, PLB, and/or WL may also change for proper read and/or writeoperations. In various embodiments, PL is parallel to BL. In someembodiments, transistors MN₁ and MN₂ are fabricated in different layersof a die. For example, transistor MN₁ is fabricated on the frontend ofthe die while transistors MN₂ and/or MN₃ are fabricated in the backendof the die. On one such embodiment, the capacitor Cfe is fabricatedbetween the frontend and the backend of the die. In one example,capacitor Cfe and Cd are vertically stacked capacitors. As such, ataller bit-cell is formed with same or comparable x-y footprint as thefootprint of a 1T1C memory bit-cell.

While the embodiment of FIG. 4 is illustrated with reference to PL andPLB being parallel to BL, the common mode compensation scheme usingdielectric capacitor Cd is also applicable to bit-cells with PL and PLBparallel to the WL. Likewise, while the embodiments are described withreference to pillar capacitors, both the first (Cfe) and second (Cd)capacitors can be planar capacitors, in accordance with someembodiments.

FIG. 5A illustrates apparatus 500 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes onetransistors and multiple capacitors (1TnC) and one compensationcapacitor, in accordance with some embodiments. Apparatus 500 is similarto apparatus 200 of FIG. 2 but for a different kind of memory bit-cell.In some embodiments, each memory bit-cell in memory array 501 isorganized in rows and columns like in apparatus 200. For example, memorybit-cells 501 _(0,0) through 501M,N are organized in an array. In someembodiments, memory bit-cell 501 _(0,0) comprises one transistor MN₁ anda plurality of capacitors Cfe1, Cfe2, through Cfen (where ‘n’ is anumber greater than 1) comprising non-linear polar material (e.g.,ferroelectric, paraelectric, or non-linear dielectric). While theembodiments are described with reference to memory bit-cell 501 _(0,0),they are applicable to other bit-cells of array 501. The capacitors canbe a planar or non-planar capacitor as described with reference tovarious embodiments. In some embodiments, the plurality of capacitorsCfe1, Cfe2, through Cfen are stacked capacitors.

The gate terminal of transistors MN₁ is controllable by WL. In someembodiments, BL is coupled to a source or drain terminal of transistorMN₁. In some embodiments, an individual PL of a plurality of PLs iscoupled to an individual capacitor. For example, capacitor Cfe1 iscoupled to plate-line PL0_1, capacitor Cfe2 is coupled to plate_linePL0_2, and capacitor Cfen is coupled to plate_line PL0_n. In someembodiments, the plurality of capacitors is coupled to storage node sn1,which is coupled to a drain or source terminal of transistor MN₁. Forexample, a first terminal of capacitor Cfe1 is coupled to PL0_1 and asecond terminal of capacitor Cfe1 is coupled to storage node sn1.

In various embodiments, pulse line PLB_x and dielectric capacitor Cdprovide common mode compensation. In some embodiments, capacitor Cd iscoupled to source or drain terminal of transistor MN₁ and to plate-linePLB_x. In various embodiments, one or more circuitries (e.g., driver inlogic 203) are provided to apply or drive a voltage on PLB_x. Thevoltage on PLB_x is opposite to a voltage applied to the selectedcapacitor (e.g., one of Cfe1, Cfe2, . . . Cfen) via one of the PLs(e.g., one of PL0_1, PL0_2, . . . PL0_n) to compensate for dielectriccapacitor dependent charge. In some embodiments, PLB_x has a voltagecomplementary to a voltage on the selected PL (e.g., one of PL0_1,PL0_2, . . . PL0_n). In some embodiments, PLBx is complementary to aselected PL for a bit-cell. For example, PLB_x is complementary to PL0_2(selected in this example) of bit-cell 501 _(0,0.)

While the various embodiments are illustrated with reference to ann-type transistor, the embodiments are also applicable to a p-typetransistor or a combination of n-type or p-type transistors. A personskilled in the art would appreciate that when a transistor of adifferent conductivity type is used, than what is shown in FIG. 5A, thendriving logic for BL, PLs, PLB_x, and/or WL may also change for properread and/or write operations. In various embodiments, PLs are parallelto BL. For example, PL0_1, PL0_2, . . . PL0_n and PLB_x are parallel toBL. In some embodiments, PL0_1, PL0_2, . . . PL0_n and PLB_x areparallel to WL. In some embodiments, transistor MN₁ is fabricated on thefrontend of the die and capacitors are stacked over the transistor. Forexample, the capacitors Cfe1 though Cfen and Cd are stacked along thez-direction. The capacitors can be planar or non-planar capacitors. Assuch, a taller bit-cell is formed with same x-y footprint as thefootprint of a 1T1C memory bit-cell. In some embodiments, the x-yfootprint is determined by the size of transistor MN₁ and itsconnections to BL, PLB, PLs, WL, and storage node sn1.

In some embodiments, PL (e.g., PL0_1, PL0_2, . . . PL0_n) controls whichcapacitor of the bit-cell is programmed, and the value of programming.In some embodiments, BL acts as a sense-line. The voltage on BL (e.g.,sense voltage) can create disturbance on other bit-lines during readoperation. To mitigate such disturbances, in some embodiments, the 1TnCbit-cell is periodically refreshed (e.g., every 1 second). In someembodiments, periodic refresh is minimized by refreshing in active modeof operation. In standby mode (e.g., low power mode), the 1TnC bit-cellis not refreshed as there is no disturb mechanism during standby. Insome embodiments, a wear-leveling logic (not shown) provides one or moreendurance mechanisms for the 1TnC memory bit-cells. One of the endurancemechanisms involves refreshing of the data content in the capacitor(s).

FIG. 5B illustrates apparatus 520 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes onetransistors and multiple capacitors (1TnC), one compensation capacitor,and individual transistors for each of the multiple capacitors, inaccordance with some embodiments. Apparatus 520 is like apparatus 500,but with switches in the path of the plate-lines and hence a differentkind of memory bit-cell. These switches are added to remove the chargedisturb effect of unselected bit-cells when bit-lines are arrangedparallel to the plate-lines. The charge disturb effect here is on thestored state of the capacitors with non-linear polar material. By addingthe switches, the plate-lines are no longer directly affecting thecharge disturb effect because of the corresponding WLs that controls theswitches.

In some embodiments, each memory bit-cell in memory array 521 isorganized in rows and columns like in apparatus 520, but with bit-linesrunning parallel to the plate-lines. For example, memory bit-cells 521_(0,0) through 521 _(M,N) are organized in an array. In someembodiments, n-type transistor MN_(PLO_1) is coupled to Cfe1 andplate-line PL0_1. In some embodiments, n-type transistor MN_(PLO_2) iscoupled to Cfe2 and plate-line PL0_2. Likewise, in some embodiments,n-type transistor MN_(PLO_n) is coupled to Cfen and plate-line PL0_n. Insome embodiments, n-type transistor MN_(PLB_x) is coupled compensationcapacitor Cd and PLB_x. Each transistor (or switch) is controlledseparately, in accordance with some embodiments. In some embodiments,transistor MN_(PLO_1) is controllable by WL0_1, transistor MN_(PLO_2) iscontrollable by WL0_2, and so on. Likewise, transistor MN_(PL0_n) iscontrollable by WL0_n. In some embodiments, transistor MN_(PLB_x) iscontrollable by WL0_x. Here, WL0_1 . . . WL0_n are the extensions of anaddress space. In this case, depending upon which storage element isbeing programmed or read, the corresponding WL0_1 . . . WL0_n are kepthigh (e.g., Vdd) whenever the plate-line voltage of 0V or Vdd isapplied, while the unselected storage element sees 0V. In someembodiments, PLBx is complementary to a selected PL for a bit-cell. Forexample, PLB_x is complementary to PL0_2 (selected in this example) ofbit-cell 521 _(0,0.)

While the various embodiments are illustrated with reference to ann-type transistors or switches, the embodiments are also applicable to ap-type transistor or a combination of n-type or p-type transistors. Aperson skilled in the art would appreciate that when a transistor of adifferent conductivity type is used, than what is shown in FIG. 5B, thendriving logic for BL, PLs, PLB_x, and/or WLs may also change for properread and/or write operations.

In some embodiments, the switches added to the plate-lines arefabricated in different layers of a die. For example, transistor MN₁ isfabricated on the frontend of the die while transistors MN_(PLO_1),MN_(PLO_2), . . . MN_(PLO_n), and MN_(PLB_x) are fabricated in thebackend of the die. On one such embodiment, the capacitor Cfe isfabricated between the frontend and the backend of the die. In oneexample, capacitor Cfe and Cd are vertically stacked capacitors. In someembodiments, each switch and its corresponding coupled capacitor isformed in the backend of the die. In some embodiments, each switch andits corresponding coupled capacitor is stacked vertically. For example,transistor MN_(PLO_1) and capacitor Cfe1 are stacked vertically in afirst vertical stack, and transistor MN_(PLO_2) and capacitor Cfe2 arestacked vertically in a second vertical stack. These backed transistorsor switches can be fabricated using any suitable technology such as IGZO(Indium gallium zinc oxide).

FIG. 6A illustrates apparatus 600 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes amulti-element gain memory bit-cell which includes one compensationcapacitor, in accordance with some embodiments. Apparatus 600 is similarto apparatus 200 of FIG. 2 but for a different kind of memory bit-cell.In some embodiments, each memory bit-cell in memory array 601 isorganized in rows and columns like in apparatus 200. For example, memorybit-cells 601 _(0,0) through 601 _(M,N) are organized in an array.

In some embodiments, bit-cell 601 _(0,0) comprises n-type transistorMN₁, n-type transistor MTR₁, bit-line (BL), word-line (WL), select-line(SL), and ‘n’ number of ferroelectric (or paraelectric) capacitors Cfe1through Cfen, dielectric capacitor Cd, ‘n; number of plate-lines (e.g.,PL0_1 through PL0_n), and PLB_x. In various embodiments, the gateterminal of n-type transistor MN₁ is coupled to WL (e.g., WL1). In someembodiments, the drain or source terminal of n-type transistor MN₁ iscoupled to BL. In various embodiments, first terminals of each of thecapacitors Cfe1 through Cfen is coupled to a storage node sn1. Thestorage node sn1 is coupled to a source or drain terminal of n-typetransistor MN₁ and to a gate of transistor MTR₁. In various embodiments,drain or source terminal of MTR₁ is coupled to a bias voltage Vs. Insome embodiments, Vs is a programmable voltage that can be generated byany suitable source. Vs voltage helps in biasing the gain transistor inconjunction with the sense-voltage that builds at sn1 node. In someembodiments, the source or drain terminal of transistor MTR₁ is coupledto SL (e.g., SL1). In some embodiments, a p-type transistor can be usedas well for gain.

In some embodiments, second terminals of each of the capacitors Cfe1through Cfen is coupled to a corresponding plate-line (PL). For example,the second terminal of Cfe1 is coupled to PL0_1, the second terminal ofCfe2 is coupled to PL0_2, and so on. In some embodiments, capacitor Cdis coupled to source or drain terminal of transistor MN₁ and toplate-line PLB_x. In various embodiments, one or more circuitries(driver in logic 203) are provided to apply or drive a voltage on PLB_x.The voltage on PLB_x is opposite to a voltage applied to the selectedcapacitor (e.g., one of Cfe1, Cfe2, . . . Cfen) via one of the PLs(e.g., one of PL0_1, PL0_2, . . . PL0_n) to compensate for dielectriccapacitor dependent charge. In some embodiments, PLB_x has a voltagecomplementary to a voltage on the selected PL (e.g., one of PL0_1,PL0_2, . . . PL0_n).

In some embodiments, ferroelectric (or paraelectric) capacitors Cfe1through Cfen are planar capacitors such as those discussed withreference to various embodiments herein. In some embodiments,ferroelectric (or paraelectric) capacitors Cfe1 through Cfen, anddielectric capacitor Cd are pillar capacitors such as those discussedwith reference to various embodiments herein. In some embodiments, theferroelectric (or paraelectric) capacitors Cfe1 through Cfen anddielectric capacitor Cd are vertically stacked allowing for tallbit-cells (e.g., higher in the z-direction) but with x-y footprint twotransistors. By folding the capacitors, the diffusion capacitance on theBL reduces for a given array size, which improves reading speed.Further, folding the capacitors lowers the effective routing capacitanceon the BL. The larger footprint in the x-y direction of multi-element FEgain bit-cell compared to the footprint in the x-y direction of 1TnCbit-cell, vertical height of the capacitor can be reduced as thecapacitors can expand in the x-y direction more than before for a givenheight. As such, capacitors are folded more effectively. For example,n/2 capacitors per metal or via layer can be packed. In variousembodiments, more capacitors can be stacked in multi-element FE gainbit-cell because storage node sn1 is decoupled from the BL. Themulti-element FE gain bit-cell reduces the thickness scaling requirementfor the pillar capacitor. The polarization density requirements arereduced for multi-element FE gain bit-cell compared to 1TnC bit-cell.

In this example, the x-y footprint is determined by the size oftransistor MN₁ and its connections to BL, WL, and storage node sn1. Insome embodiments, the footprint can still be decided by other factorssuch as a number of capacitors that connect to the node, and how thecapacitors are arranged, e.g., more folding on the same node versusstacking, effective size constraints on those capacitors, and number ofcapacitors that share the same bit-cell. In some embodiments, PL (e.g.,PL0_1, PL0_2, . . . PL_n) controls which cell within the same accesstransistor gets programmed, and the value of programming. In someembodiments, BL acts as a sense-line. The voltage on BL (e.g., sensevoltage) can create disturbance on other bit-lines during readoperation. To mitigate such disturbances, in some embodiments,multi-element FE gain bit-cell 601 _(0,0) is periodically refreshed(e.g., every 1 second). In some embodiments, periodic refresh isminimized by refreshing in active mode of operation that can be coupledwith advance schemes for wear leveling. In standby mode (e.g., low powermode), multi-element FE gain bit-cell 601 _(0,0) is not refreshed asthere is no disturb mechanism during standby. In some embodiments,multi-element FE gain bit-cell 601 _(0,0) relies on isolating the readmode from BL or SL capacitance by isolating through access transistorMN₁, where MN₁ transistor facilitates pre-charging the sn1 node, priorto read operation.

In some embodiments, there is a possibility of disturbance at thestorage node sn1 during read operation. In some embodiments, PL istoggled for other capacitors to the average value of the disturbancethat will be seen on the sn1 node. i.e., when a read pulse of somepolarity is applied at PL line of the capacitor to be read, a non-zerovoltage is applied on other PLs of multi-element gain bit-cell 601_(0,0), that matches the expected disturbance seen on the shared node.In one such example, PL line driver is configured to support drivingdifferent voltage levels on different PLs. In some embodiments,wear-leveling logic (not shown) provides one or more endurancemechanisms for the multi-element gain bit-cells. One of the endurancemechanisms involves refreshing of the data content in the capacitor(s).

While the embodiment of FIG. 6A is illustrated with reference to PLs(e.g., PL0_1, PL0_2, . . . ) and PLB_x being parallel to BL, the commonmode compensation scheme using dielectric capacitor Cd is alsoapplicable to bit-cells with PLs (e.g., PL0_1, PL0_2, . . . ) and PLB_xparallel to the WL. Likewise, while the embodiments are described withreference to pillar capacitors, both the first and second capacitors canbe planar capacitors, in accordance with some embodiments.

FIG. 6B illustrates apparatus 620 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material basedmemory bit-cell, where an individual memory bit-cell includes amulti-element gain memory bit-cell which includes one compensationcapacitor and individual transistors for each of the multiple capacitorsof the multi-element gain bit-cell, in accordance with some embodiments.

Apparatus 620 is like apparatus 600, but with switches in the path ofthe plate-lines and hence a different kind of memory bit-cell. Theseswitches are added to remove the charge disturb effect of unselectedbit-cells when bit-lines are arranged parallel to the plate-lines. Thecharge disturb effect here is on the stored state of the capacitors withnon-linear polar material. By adding the switches, the plate-lines areno longer directly effecting the charge disturb effect because of thecorresponding WLs that controls the switches.

In some embodiments, each memory bit-cell in memory array 621 isorganized in rows and columns like in apparatus 600, but with bit-linesrunning parallel to the plate-lines. For example, memory bit-cells 621_(0,0) through 621 _(M,N) are organized in an array. In someembodiments, n-type transistor MN_(PLO_1) is coupled to Cfe1 andplate-line PL0_1. In some embodiments, n-type transistor MN_(PLO_2) iscoupled to Cfe2 and plate-line PL0_2. Likewise, in some embodiments,n-type transistor MN_(PLO_n) is coupled to Cfen and plate-line PL0_n. Insome embodiments, n-type transistor MN_(PLB_x) is coupled compensationcapacitor Cd and PLB_x. Each transistor (or switch) is controlledseparately, in accordance with some embodiments. In some embodiments,transistor MN_(PLO_1) is controllable by WL0_1, transistor MN_(PLO_2) iscontrollable by WL0_2, and so on. Likewise, transistor MN_(PL0_n) iscontrollable by WL0_n. In some embodiments, transistor MN_(PLB_x) iscontrollable by WL0_x. Here, WL0_1 . . . . WL0_n are the extensions ofan address space. In this case, depending upon which storage element isbeing programmed or read, the corresponding WL0_1 . . . WL0_n are kepthigh (e.g., Vdd) whenever the plate-line voltage of 0V or Vdd isapplied, while the unselected storage element sees 0V.

While the various embodiments are illustrated with reference to ann-type transistors or switches, the embodiments are also applicable to ap-type transistor or a combination of n-type or p-type transistors. Aperson skilled in the art would appreciate that when a transistor of adifferent conductivity type is used, than what is shown in FIG. 6B, thendriving logic for BL, PLs, PLB_x, and/or WLs may also change for properread and/or write operations.

In some embodiments, the switches added to the plate-lines arefabricated in different layers of a die. For example, transistor MN₁ isfabricated on the frontend of the die while transistors MN_(PLO_1),MN_(PLO_2), . . . MN_(PLO_n), and MN_(PLB_x) are fabricated in thebackend of the die. On one such embodiment, the capacitor Cfe isfabricated between the frontend and the backend of the die. In oneexample, capacitor Cfe and Cd are vertically stacked capacitors. In someembodiments, each switch and its corresponding coupled capacitor isformed in the backend of the die. In some embodiments, each switch andits corresponding coupled capacitor is stacked vertically. For example,transistor MN_(PLO_1) and capacitor Cfe1 are stacked vertically in afirst vertical stack, and transistor MN_(PLO_2) and capacitor Cfe2 arestacked vertically in a second vertical stack. These backed transistorsor switches can be fabricated using any suitable technology such as IGZO(Indium gallium zinc oxide).

FIG. 7A illustrates a cross-sectional view 700 of 1TnC bit-cells withstacked planar non-linear polar material based capacitors and a planardielectric capacitor, in accordance with some embodiments. In thisexample, four transistors are shown, each controlled by its respectiveWL on its gate terminal. The source and drain terminals of eachtransistor is coupled to respective contacts (CA). A pair of transistorsare grouped together and separated from other pairs via isolationregion. Etch stop layer is used in the fabrication of vias (via0) toconnect the source and drain of the transistors to BLs on metal-1 (M1)layer. Another etch stop layer is formed over M1 layer to fabricate vias(via1) to couple to respective M1 layers. In some embodiments, metal-2(M2) is deposited over vias (via1). M2 layer is then polished. In someembodiments, the capacitor can be moved further up in the stack, wherethe capacitor level processing is done between different layers. In someembodiments, BL can be escaped on a different layer than shown. Here,bit-cell 701 _(0,0) illustrate one 1TnC bit-cell with dielectriccapacitor Cd.

In some embodiments, oxide is deposited over the etch stop layer.Thereafter, dry, or wet etching is performed to form holes forpedestals. The holes are filled with metal and land on the respective M2layers. Fabrication processes such as interlayer dielectric (ILD) oxidedeposition followed by ILD etch (to form holes for the pedestals),deposition of metal into the holes, and subsequent polishing of thesurface are used to prepare for post pedestal fabrication.

A number of fabrication processes of deposition, lithography, andetching takes place to form the stack of layers for the planarcapacitor. In some embodiments, the planar ferroelectric or paraelectriccapacitors are formed in a backend of the die. In some embodiments,deposition of ILD is followed by surface polish. In some embodiments, PLis formed over top electrode of each capacitor. In this case, afterpolishing the surface, ILD is deposited, in accordance with someembodiments. Thereafter, holes are etched through the ILD to expose thetop electrodes of the capacitors, in accordance with some embodiments.The holes are then filled with metal, in accordance with someembodiments. Followed by filling the holes, the top surface is polished,in accordance with some embodiments. As such, the capacitors areconnected to PL and storage nodes (through the pedestals), in accordancewith some embodiments.

In some embodiments, ILD is deposited over the polished surface. Holesfor via are then etched to contact the M2 layer, in accordance with someembodiments. The holes are filled with metal to form vias (via2), inaccordance with some embodiments. The top surface is then polished, inaccordance with some embodiments. In some embodiments, process ofdepositing metal over the vias (via2), depositing ILD, etching holes toform pedestals for the next capacitors of the stack, forming thecapacitors, and then forming vias that contact the M3 layer arerepeated. This process is repeated ‘n’ times for forming ‘n’ capacitorsin a stack, in accordance with some embodiments. In some embodiments,the dielectric capacitor Cd (shown with a different shaded capacitor) isformed in the stack over the stacks of non-linear polar material basedcapacitors. One terminal of Cd is coupled to the storage node (e.g.,sn1) and the other terminal of Cd is coupled to a complementary PL(e.g., PL0B_x). In some embodiments, the dielectric capacitor Cd isformed in the stack in the middle of the stack of non-linear polarmaterial based capacitors. In some embodiments, the dielectric capacitorCd is formed as the first capacitor of the stack of non-linear polarmaterial based capacitors.

In some embodiments, the bottom electrode of each capacitor is allowedto directly contact with the metal below. In this embodiment, the heightof the stacked capacitors is lowered, and the fabrication process issimplified because the extra steps for forming the pedestals areremoved.

In some embodiments, pedestals or vias are formed for both the top andbottom electrodes of the non-linear polar material based capacitorand/or the Cd capacitor. In this embodiment, the height of the stackedcapacitors is raised, and the fabrication process adds an additionalstep of forming a top pedestal or via which contacts with a respectivePL. In some embodiments, a similar structure can be used for themulti-element gain memory bit-cell having the dielectric capacitor.

FIG. 7B illustrates a cross-section view 720 and possible structures ofthe planar non-linear polar material based capacitors 721, 722, or 723used in FIG. 7A, in accordance with some embodiments.

FIG. 7C illustrates a cross-section view 730 and possible structure ofthe planar dielectric capacitor Cd used in FIG. 7A, in accordance withsome embodiments.

FIG. 8 illustrates a pillar FE capacitor 800 including cross-sectionalviews and a 3D view, in accordance with some embodiments. In variousembodiments, FE pillar capacitor 800 is cylindrical in shape. In someembodiments, FE pillar capacitor 800 is rectangular in shape. Taking thecylindrical shaped case for example, in some embodiments, the layers ofFE pillar capacitor 800 from the center going outwards include oxidescaffolding 802, bottom electrode 801 a, first conductive oxide 812 a,FE material 813, second conductive oxide 812 b, and top electrode 801 b.A cross-sectional view along the “ab” dashed line is illustrated in themiddle of FIG. 8 . In some embodiments, bottom electrode 801 a isconformally deposited over oxide scaffolding 802 (e.g., SiO2 or anyother suitable dielectric). In some embodiments, first conductive oxide812 a is conformally deposited over bottom electrode 801 a. In someembodiments, FE material 813 is conformally deposited over firstconductive oxide 812 a. In some embodiments, second conductive oxide 812b is conformally deposited over FE material 813. In some embodiments,top electrode 801 b is conformally deposited over second conductiveoxide 812 b. In some embodiments, the oxide scaffolding is etched andmetal is deposited into it which becomes part of bottom electrode 801 a.In some embodiments, a top section of FE pillar capacitor 800 that formsan upside-down ‘U’ shape is chopped off (e.g., by etching). This allowsbottom electrode 801 a to be accessible from the top and bottom of FEpillar capacitor 800, where bottom electrode 801 a is in the centerwhile top electrode 801 b is on an outer circumference of FE pillarcapacitor 800.

In some embodiments, wherein bottom electrode 801 a (herein first layer)has a first circumference, wherein first conductive oxide 812 a (hereinsecond layer) has a second circumference, wherein FE material 813(herein third layer) has a third circumference, wherein secondconductive oxide 812 b (herein fourth layer) has a fourth circumference,and wherein the top electrode 801 b (herein fifth layer) has a fifthcircumference. In some embodiments, the fourth circumference is largerthan the third circumference, wherein the third circumference is largerthan the second circumference, and wherein the second circumference islarger than the first circumference.

In various embodiments, the choice of materials for FE pillar capacitor800 are similar to the choice of material for the FE planar capacitor ofFIG. 3A. For example, the materials for FE pillar capacitor 800 can beselected from a same group of materials listed for the FE planarcapacitor FIG. 3A. In various embodiments, material for bottom electrode801 a corresponds to bottom electrode 309 b, material for firstconductive oxide 812 a corresponds to first conductive oxide 312 a, FEmaterial 813 corresponds to FE material 313, material for secondconductive oxide 812 b corresponds to second conductive oxide 312 b, andmaterial for top electrode 801 a corresponds to top electrode 309 a. Insome embodiments, a first refractive inter-metallic layer (not shown) isformed between FE material 813 and first conductive oxide 812 a. In someembodiments, a second refractive inter-metallic layer (not shown) isformed between FE material 813 and second conductive oxide 812 b. Inthese cases, the first and second refractive inter-metallic layers aredirectly adjacent to their respective conductive oxide layers and to FEmaterial 813. Refractive inter-metallic maintains the FE properties ofthe FE material 813. In the absence of refractive inter-metallic, theferroelectric material 813 (or the paraelectric material) of pillarcapacitor 800 may lose its potency. In some embodiments, refractiveinter-metallic comprises Ti and Al (e.g., TiAl compound). In someembodiments, refractive inter-metallic comprises one or more of Ta, W,and/or Co. Material discussed with reference to layers 311 a and 311 bcan be used for the first and second refractive inter-metallic layershere. The thicknesses of the layers of FE pillar capacitor 800 are ofthe same range as similar layers discussed in FIG. 3A for a planar FEcapacitor.

FIG. 9A illustrates a 3D view of a 1T1C bit-cell 900 where thetransistor MN is a planar transistor and where the capacitor is anon-planar capacitor 800 with non-linear polar material, where thebit-cell includes a compensation capacitor Cd, in accordance with someembodiments. The layers and/or structures of bit-cell 900 are describedwith reference to FIG. 3A and FIG. 8 . Here, planar capacitor Cfe ofFIG. 3A is replaced with a pillar capacitor 800.

FIG. 9B illustrates a 3D view of a 1T1C bit-cell 920 where thetransistor is a non-planar transistor and where the capacitor is anon-planar capacitor 800 with non-linear polar material, where thebit-cell includes a compensation capacitor Cd, in accordance with someembodiments. The layers and/or structures of bit-cell 920 are describedwith reference to FIG. 3B and FIG. 8 . Here, planar capacitor Cfe ofFIG. 3B is replaced with a pillar capacitor 800.

FIG. 10 illustrates a cross-sectional view 1000 of 1TnC bit-cells withstacked non-planar non-linear polar material based capacitors and anon-planar dielectric capacitor, in accordance with some embodiments. Inthis example four 1TnC bit-cells are shown, where ‘n’ is three, plus adielectric capacitor. Each group of capacitors for a bit-cell has acolumn of shared metal passing through the center of the capacitors,where the shared metal is the storage node which is coupled to the stuband then to the source or drain terminal. Top electrode of each of thecapacitor is partially adjacent to a respective plate-line. In thisinstance, the capacitors are formed between regions reserved for Vialthrough Via5 (e.g., between M1 through M6 layers). In some embodiments,the dielectric capacitor Cd is formed in the stack over the stacks ofnon-linear polar material based capacitors (e.g., Cfe1, Cfe2, Cfe3). Insome embodiments, the dielectric capacitor Cd is formed in the stack inthe middle of the stack of non-linear polar material based capacitors.In some embodiments, the dielectric capacitor Cd is formed in as thefirst capacitor of the stack of non-linear polar material basedcapacitors.

FIG. 11 illustrates a cross-sectional view of a non-planar dielectriccapacitor 1100, in accordance with some embodiments. In someembodiments, non-planar dielectric capacitor 1100 is rectangular inshape. Taking the cylindrical shaped case for example, in someembodiments, the layers of non-planar dielectric capacitor 1100 from thecenter going outwards include bottom electrode 1101 a, first conductiveoxide 1112 a, linear dielectric material 1113, second conductive oxide1112 b, and top electrode 1101 b. A cross-sectional view along the “ab”dashed line is illustrated in the middle of FIG. 11 . In someembodiments, conducting oxides are removed and the linear dielectric isdirectly connected to top electrode 1101 b and bottom electrodes 1101 a.In some embodiments, linear dielectric material 1113 can include anysuitable dielectric, where the thickness of dielectric film is a rangeof 1 nm to 20 nm. In some embodiments, linear dielectric material 1113comprises a higher-K dielectric material. In some embodiments, lineardielectrics include one of: SIO2, Al2O3, Li2O, HfSiO4, Sc2O3, SrO, HfO2,ZrO2, Y2O3, Ta2O5, BaO, WO3, MoO3, or TiO2.

In some embodiments, first conductive oxide 1112 a is conformallydeposited over bottom electrode 1101 a. In some embodiments, dielectricmaterial 1113 is conformally deposited over first conductive oxide 1112a. In some embodiments, second conductive oxide 1112 b is conformallydeposited over dielectric material 1113. In some embodiments, topelectrode 1101 b is conformally deposited over second conductive oxide1112 b. In some embodiments, bottom electrode 1101 a is in the centerwhile top electrode 1101 b is on an outer circumference of dielectriccapacitor 1100.

In some embodiments, material for bottom electrode 1101 a corresponds tobottom electrode 309 b, material for first conductive oxide 1112 acorresponds to first conductive oxide 312 a, material for secondconductive oxide 1112 b corresponds to second conductive oxide 312 b,and material for top electrode 1101 b corresponds to top electrode 309a. In some embodiments, a first refractive inter-metallic layer (notshown) is formed between dielectric material 1113 and first conductiveoxide 1112 a. In some embodiments, a second refractive inter-metalliclayer (not shown) is formed between dielectric capacitor material 1113and second conductive oxide 1112 b. In these cases, the first and secondrefractive inter-metallic layers are directly adjacent to theirrespective conductive oxide layers and to dielectric capacitor material1113. In some embodiments, refractive inter-metallic maintains thecapacitive properties of the dielectric capacitor material 1113. In someembodiments, refractive inter-metallic comprises Ti and Al (e.g., TiAlcompound). In some embodiments, refractive inter-metallic comprises oneor more of Ta, W, and/or Co. Material discussed with reference to layers311 a/b can be used for the first and second refractive inter-metalliclayers. The thicknesses of the layers of dielectric capacitor 1100 areof the same range as similar layers discussed in FIG. 3A for the planarnon-linear polar material based capacitor. In some embodiment,refractive inter-metallic layers are not used for dielectric capacitorCd.

FIG. 12A illustrates apparatus 1200 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes 1T1C and one compensationcapacitor, in accordance with some embodiments. In some cases,single-ended memory bit-cells comprising non-linear polar material maysuffer from asymmetry in the switching voltages for positive andnegative polarity. This is due to the spatial migration of the atomsfrom/to the electrode from the ferroelectrics, when the population of 1sand 0s are imbalanced. This makes the use of typical FE capacitorschallenging for memory bit-cells because writing 0s or 1s to the FEcapacitor may need different energies, which creates an overhead forcircuit design.

Some embodiments describe a low power, high-density non-volatiledifferential memory 1201 with bit-cells that compensate for theasymmetry of typical ferroelectric capacitors. An individual bit-cellincludes a compensation capacitor to compensate for common mode. Thetransistors of the differential memory bit-cell can be planar ornon-planar and can be fabricated in the frontend or backend of a die. Abit-cell of the non-volatile differential memory bit-cell comprisesfirst transistor and first non-volatile structure that are controlled tostore data of a first value. Another bit-cell of the non-volatiledifferential memory bit-cell comprises second transistor and secondnon-volatile structure that are controlled to store data of a secondvalue, wherein the first value is an inverse of the second value. Thefirst and second volatile structures comprise low voltage ferroelectricmaterial (e.g., perovskite, hexagonal ferroelectric, or improperferroelectric) that can switch its state by small voltage change (e.g.,100 mV).

In some embodiments, differential bit-cell 1201 _(0,0) comprises aword-line (WL), a plate-line (PL), a bit-line (BL), a complementarybit-line (BLB), a complimentary plat-line (PLB), and two half bit-cells1201 _(0,0_A) and 1201 _(0,0_B). In some embodiments, first halfbit-cell 1201 _(0,0_A) comprises an n-type transistor MN₁, a FEcapacitive structure Cfe₁, and a linear dielectric capacitor Cd₁. Insome embodiments, second half bit-cell 1201 _(0,0_B) comprises an n-typetransistor MN₂, FE capacitive structure Cfe₂, and a linear dielectriccapacitor Cd₂. The gates of transistors MN₁ and MN₂ share a common WL.In various embodiments, one terminal of first and second FE capacitivestructures (Cfe₁ and Cfe₂) is coupled to common PL. The second terminalof the first and second FE capacitive structures (Cfe₁ and Cfe₂) iscoupled to source or drain terminals of respective transistors. Invarious embodiments, one terminal of first and second linear dielectriccapacitive structures (Cd₁ and Cd₂) is coupled to a common PLB. Thesecond terminal of the first and second linear dielectric capacitivestructures (Cd₁ and Cd₂) is coupled to source or drain terminals ofrespective transistors, as shown.

For example, the second terminal of Cfe₁ is coupled to the drain orsource terminal of transistor MN₁, while the second terminal of Cfe₂ iscoupled to the drain or source terminal of transistor MN₂. Likewise, thesecond terminal of Cd₁ is coupled to the drain or source terminal oftransistor MN₁, while the second terminal of Cd₂ is coupled to the drainor source terminal of transistor MN₂. In various embodiments, BL iscoupled to the source or drain terminal of the first transistor MN₁ ofthe first half-cell 1201 _(0,0_A), while BLB is coupled to the source ordrain terminal of the second transistor MN₂ of the second half-cell 1201_(0,0_B). In some embodiments, a first BL capacitor CBl₁ (parasiticcapacitor) is coupled to the source or drain terminal of firsttransistor MN₁ and to a reference node (e.g., ground), while a second BLcapacitor CBl₂ (parasitic capacitor) is coupled to the source or drainterminal of second transistor MN₂ and to the reference node such thatthe FE capacitor is not coupled to the same source or drain terminal. Insome embodiments, the effective capacitance of the second capacitor Cd₁is equal (or substantially equal) to a linear component of thecapacitance of the first capacitor Cfe₁. In some embodiments, theeffective capacitance of the second capacitor Cd₂ is equal (orsubstantially equal) to a linear component of the capacitance of thefirst capacitor Cfe₂.

In various embodiments, half bit-cells 1201 _(0,0_A) and 1201 _(0,0_B)are self-referenced cells due to their proximal location with respect toone another. For example, the static spatial process variations arecommon mode for Cfe₁ and Cfe₂ of half bit-cells 1201 _(0,0_A) and 1201_(0,0_B), respectively. Here, BL and BLB generate opposite polaritysensing signals. Likewise, PL and PLB provide opposite polarity signals.At first use of the differential memory bit-cell, assume the criticalvoltages on the FE capacitors Cfe₁ and Cfe₂ are of the followingsequence: +VFe1, +VFe2, −VFe1, −VFe2 critical switching voltages, where+VFe1=+VFe2, −Vfe1=−vfe2 at the first operation of the memory. When theoperation of the memory leads to a symmetric switching voltages,+VFe1+DF1, −VFe1+DF1, +VFe2+DF1, −VFe2+DF1, the total switching voltageof half bit-cells 101 _(0,0_A) and 101 _(0,0_B), remains(+VFe1+DF1)−(−VFe2+DF1)=VFe1+VFe2, allowing for self-compensation of theasymmetry, where DF1 is the offset due to asymmetry. This offset isadded to the hysteresis of the behavior of the FE material.

To write data to the differential bit-cell, BL, PL, and BLB generate asignal sequence to write opposite polarity to half bit-cells 1201_(0,0_A) and 1201 _(0,0_B). For example, if logic 1 is written to halfbit-cells 1201 _(0,0_A) then logic 0 is written to half bit-cells 1201_(0,0_B). The signal scheme for sensing the data in the differentialbit-cell is similar to a sensing scheme for an SRAM (staticrandom-access memory). While the various embodiments are illustratedusing n-type transistors, the differential bit-cell can also beimplemented using p-type transistors.

While the embodiment of FIG. 12A is illustrated with reference to PL andPLB being parallel to WL, the common mode compensation scheme usingdielectric capacitors Cd₁ and Cd₂ are also applicable to bit-cells withPL and PLB parallel to the BL and BLB. Likewise, while the embodimentsare described with reference to pillar capacitors, both the first (Cfe₁and Cfe₂) and second (Cd₁ and Cd₂) capacitors can be planar capacitors,in accordance with some embodiments.

FIG. 12B illustrates apparatus 1220 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes three transistors and onecapacitor (3T1C) and one compensation capacitor, in accordance with someembodiments.

In some embodiments, a memory array 1221 comprises rows and colours ofdifferential bit cells 1221 _(0,0) through 1221 _(M,N). In someembodiments, differential bit-cell 1221 _(0,0) comprises a word-line(WL), a first plate-line (PL_A), a bit-line (BL), a complementarybit-line (BLB), a complimentary first plat-line (PLB), a secondplate-line (PL_B), a complimentary second plat-line (PLB_B), and twohalf bit-cells 1221 _(0,0_A) and 1221 _(0,0_B). Each bit-cell 1221_(0,0_A) and 1221 _(0,0_B) includes an implementation of bit-cell 400_(0,0).

In some embodiments, first half bit-cell 1221 _(0,0_A) comprises ann-type transistor MNa₁, a FE capacitive structure Cfe₁, and a lineardielectric capacitor Cd₁. In some embodiments, second half bit-cell 1221_(0,0_B) comprises an n-type transistor MNb₂, FE capacitive structureCfe₂, and a linear dielectric capacitor Cd₂. The gates of transistorsMNa₁ and MNb₂ share a common WL. In various embodiments, one terminal offirst FE capacitive structure Cfe₁ is coupled to PL_A via transistorMNa₂. The second terminal of the first FE capacitive structure Cfe₁ iscoupled to source or drain terminals of transistor MNa₂. In variousembodiments, one terminal of the second FE capacitive structure Cfe₂ iscoupled to PL_B via transistor MNb₂. The second terminal of the secondFE capacitive structure Cfe₂ is coupled to source or drain terminals oftransistor MNb₁.

In various embodiments, one terminal of the first dielectric capacitivestructure Cd₁ is coupled to PLB_A via transistor MNa₃. The secondterminal of the first dielectric capacitive structure Cd₁ is coupled tosource or drain terminals of transistor MNa₁. In various embodiments,one terminal of the second dielectric capacitive structure Cd₂ iscoupled to PLB_B via transistor MNb₃. The second terminal of the seconddielectric capacitive structure Cd₂ is coupled to source or drainterminals of transistor MNb₁.

In various embodiments, BL is coupled to the source or drain terminal ofthe first transistor MNa₁ of the first half-cell 1221 _(0,0_A), whileBLB is coupled to the source or drain terminal of the second transistorMNb₁ of the second half-cell 1221 _(0,0_B). In some embodiments, theeffective capacitance of the second capacitor Cd₁ is equal (orsubstantially equal) to a linear component of the capacitance of thefirst capacitor Cfe₁. In some embodiments, the effective capacitance ofthe second capacitor Cd₂ is equal (or substantially equal) to a linearcomponent of the capacitance of the first capacitor Cfe₂.

In various embodiments, half bit-cells 1221 _(0,0_A) and 1221 _(0,0_B)are self-referenced cells due to their proximal location with respect toone another. For example, the static spatial process variations arecommon mode for Cfe₁ and Cfe₂ of half bit-cells 1221 _(0,0_A) and 1221_(0,0_B), respectively. Here, BL and BLB generate opposite polaritysensing signals. In some embodiments, BL and BLB are drivencomplementary signals during write operation but precharged to samesignal during read operation.

In some embodiments, PL_A and PLB_A provide opposite polarity signals,and PL_B and PLB_B provide opposite polarity signals relative to oneanother. In some embodiments, PL_A and PL_B can be driving complimentarysignals during write operation while driving same signals during readoperation. In some embodiments, PL_A and PL_B can be driving samesignals during read and write operations.

In some embodiments, one or more transistors can be formed in a backendof a die. In some embodiments, the dielectric capacitor and theferroelectric capacitor for each bit-cell can be stacked. The dielectriccapacitor and the ferroelectric capacitor can be planar or pillarcapacitors.

In some embodiments, the switches added to the plate-lines arefabricated in different layers of a die. For example, transistor MNa₁ isfabricated on the frontend of the die while transistors MNa₂ and MNa₃are fabricated in the backend of the die. In some embodiments,transistor MNb₁ is fabricated on the frontend of the die whiletransistors MNb₂ and MNb₃ are fabricated in the backend of the die.

On one such embodiment, the capacitor Cfe is fabricated between thefrontend and the backend of the die. In one example, capacitor Cfe₁ andCd₁ are vertically stacked capacitors in a first vertical stack, andcapacitor Cfe₂ and Cd₂ are vertically stacked capacitors in a secondvertical stack. In some embodiments, each transistor and itscorresponding coupled capacitor(s) are formed in the backend of the die.In some embodiments, each transistor and its corresponding coupledcapacitor(s) is stacked vertically. For example, transistor MNa₂ andcapacitor Cfe₁ of bit-cell 1221 _(0,0_A) are stacked vertically in afirst vertical stack structure, and MNa₃ and capacitor Cd₁ of bit-cell1221 _(0,0_A) are stacked vertically in a second vertical stackstructure. In some embodiments, the first vertical stack structure isabove the second vertical stack structure. In some embodiments, thefirst vertical stack structure is on the same set of layers as thesecond vertical stack structure.

In some embodiments, transistor MNb₂ and capacitor Cfe₂ of bit-cell 1221_(0,0_B) are stacked vertically in a third vertical stack structure, andMNb₃ and capacitor Cd₁ of bit-cell 1221 _(0,0_B) are stacked verticallyin a fourth vertical stack structure. In some embodiments, the thirdvertical stack structure is above the fourth vertical stack structure.In some embodiments, the third vertical stack structure is on the sameset of layers as the fourth vertical stack structure. These backedtransistors or switches can be fabricated using any suitable technologysuch as IGZO (Indium gallium zinc oxide).

FIG. 13A illustrates apparatus 1300 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes 1TnC and one compensationcapacitor, in accordance with some embodiments.

Bit-cell 1301 _(0,0_A) comprises two copies of bit-cell 501 _(0,0),where one bit-cell is complementary to the other. Here, two bit-cellsare shown 1301 _(0,0_A) and 1301 _(0,0_B), that together form 1TnCdifferential bit-cell 1301 _(0,0). Both bit-cells share a common WL, andeach bit-cell has its own transistor. In this example, the plate-linesare parallel to the WLs. In some embodiments, the plate-lines (e.g.,PLB0_1, PLB0_2, through PLB0_n) for bit-cell 1301 _(0,0_B) are inverseor complementary of the plate-lines (e.g., PL0_1, PL0_2, through PL0_n)for bit-cell 1301 _(0,0_A). The same is true for bit-lines, inaccordance with some embodiments. For example, the bit-line (BLB) forbit-cell 1301 _(0,0_B) is an inverse or complementary of the bit-line(BL) for bit-cell 1301 _(0,0_A).

In some embodiments, the plate-lines for bit-cell 1301 _(0,0_A) and forbit-cell 1301 _(0,0_B) may drive the same signals during read or writeoperations. In one such example, signal driven on PL0_1 is the same assignal driven on PLB0_1 during a read operation but are complementary toone another during a write operation. Similarly, BL and BLB drivecomplementary signals during a write operation, and can be driving thesame signal during a pre-charge phase of a read operation, in accordancewith some embodiments.

In some embodiments, signals driven on the plate-lines for bothbit-cells of the differential bit-cell are the same during read andwrite operations. For example, signal driven on PL0_1 is the same assignal driven on PLB0_1 during read and write operations. In one suchexample, signals driven on BL and BLB are complementary signals during awrite operation, and can be driving the same signal during a pre-chargephase of a read operation, in accordance with some embodiments.

In some embodiments, the linear dielectric based capacitor Cd1 iscoupled to storage node sn1 and PLB0_x, which is an inverse of the PL(e.g., PL0_1, PL0_2, through PL0_n) of the selected capacitor forbit-cell 1301 _(0,0_A). In some embodiments, the effective capacitanceof the second capacitor Cd1 is equal (or substantially equal) to alinear component of the capacitance of the selected non-linear polarmaterial based capacitor of bit-cell 1301 _(0,0_A). In some embodiments,the linear dielectric based capacitor Cd2 is coupled to storage node sn2and PL0_x, which is an inverse of the PLB (e.g., PLB0_1, PLB0_2, throughPLB0_n) of the selected capacitor for bit cell 1301 _(0,0_B). In someembodiments, the effective capacitance of the second capacitor Cd2 isequal (or substantially equal) to a linear component of the capacitanceof the selected non-linear polar material based capacitor of bit-cell1301 _(0,0_B).

While the embodiment of FIG. 13A is illustrated with reference to PLs(e.g., PL0_1, PL0_2, . . . PL0_n) and PLB0_x and PL0_x being parallel toWL, the common mode compensation scheme using dielectric capacitors Cd1and Cd2 are also applicable to bit-cells with PLs (e.g., PL0_1, PL0_2, .. . PL0_n) and PLB0_x and PL0_x parallel to the BL and BLB. Likewise,while the embodiments are described with reference to pillar capacitors,both the first (Cfe1 and Cfe2) and second (Cd1 and Cd2) capacitors canbe planar capacitors, in accordance with some embodiments. In someembodiments, PLB0x is complementary to a selected PL for a samebit-cell. For example, PLB0_x is complementary to PL0_2 (selected inthis example) of bit-cell 1301 _(0,0_A). In some embodiments, PL0x iscomplementary to a selected PL for a same bit-cell. For example, PL0_xis complementary to PLB0_2 (selected in this example) of bit-cell 1301_(0,0_B). Depending on the read or write operation, in some embodiments,PL0x is either complementary to PLB0_x or same as PL0_x.

FIG. 13B illustrates apparatus 1320 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes 1TnC and one compensationcapacitor, and individual transistors for each of the capacitors inaccordance with some embodiments.

Bit-cell 1321 _(0,0_A) comprises two copies of bit-cell 521 _(0,0),where one bit-cell is complementary to the other. Here, two bit-cellsare shown 1321 _(0,0_A) and 1321 _(0,0_B), that together form 1TnCdifferential bit-cell 1321 _(0,0). Both bit-cells share a common WL, andeach bit-cell has its own transistor. Apparatus 1320 is like apparatus1300, but with switches in the path of the plate-lines and hence adifferent kind of memory bit-cell. These switches are added to removethe charge disturb effect of unselected bit-cells when bit-lines arearranged parallel to the plate-lines. The charge disturb effect here ison the stored state of the capacitors with non-linear polar material. Byadding the switches, the plate-lines are no longer directly affectingthe charge disturb effect because of the corresponding WLs that controlsthe switches.

In some embodiments, each memory bit-cell 1321 in a memory array isorganized in rows and columns, but with bit-lines running parallel tothe plate-lines. For example, memory bit-cells 1321 _(0,0) through 1321_(M,N) (not shown) are organized in an array. In some embodiments, forbit-cell 1321 _(0,0_A), n-type transistor MN1_(PLO_1) is coupled to Cfe1and plate-line PL0_1. In some embodiments, n-type transistor MN1_(PLO_2)is coupled to Cfe2 and plate-line PL0_2. Likewise, in some embodiments,n-type transistor MN1_(PLO_n) is coupled to Cfen and plate-line PLB_n.In some embodiments, n-type transistor MN1_(PLB_x) is coupledcompensation capacitor Cd and PLB0_x. Each transistor (or switch) iscontrolled separately, in accordance with some embodiments. In someembodiments, transistor MN_(PLO_1) is controllable by WL0_1, transistorMN1_(PLO_2) is controllable by WL0_2, and so on. Likewise, transistorMN1_(PLO_n) is controllable by WL0_n. In some embodiments, transistorMN1_(PLB_x) is controllable by WL0_x. Here, WL0_1 . . . WL0_n are theextensions of an address space. In this case, depending upon whichstorage element is being programmed or read, the corresponding WL0_1 . .. WL0_n are kept high (e.g., Vdd) whenever the plate-line voltage of 0Vor Vdd is applied, while the unselected storage element sees 0V.

In some embodiments, for bit-cell 1321 _(0,0_B), n-type transistorMN2_(PLO_1) is coupled to Cfe1 and plate-line PLB0_1. In someembodiments, n-type transistor MN2_(PLO_2) is coupled to Cfe2 andplate-line PLB0_2. Likewise, in some embodiments, n-type transistorMN2_(PLO_n) is coupled to Cfen and plate-line PLB0_n. In someembodiments, n-type transistor MN2_(PLB_x) is coupled compensationcapacitor Cd and PL0_x. Each transistor (or switch) is controlledseparately, in accordance with some embodiments. In some embodiments,transistor MN2_(PLO_1) is controllable by WL0_1, transistor MN2_(PLO_2)is controllable by WL0_2, and so on. Likewise, transistor MN2_(PL0_n) iscontrollable by WL0_n. In some embodiments, transistor MN2_(PLB_x) iscontrollable by WL0_x. Here, WL0_1 . . . . WL0_n are the extensions ofan address space. In this case, depending upon which storage element isbeing programmed or read, the corresponding WL0_1 . . . WL0_n are kepthigh (e.g., Vdd) whenever the plate-line voltage of 0V or Vdd isapplied, while the unselected storage element sees 0V.

While the various embodiments are illustrated with reference to ann-type transistors or switches, the embodiments are also applicable to ap-type transistor or a combination of n-type or p-type transistors. Aperson skilled in the art would appreciate that when a transistor of adifferent conductivity type is used, than what is shown in FIG. 13B,then driving logic for BL, PLs, PLB_x, and/or WLs may also change forproper read and/or write operations.

In some embodiments, the plate-lines for bit-cell 1321 _(0,0_A) and forbit-cell 1321 _(0,0_B) may drive the same signals during read or writeoperations. In one such example, signal driven on PL0_1 is the same assignal driven on PLB0_1 during a read operation but are complementary toone another during a write operation. Similarly, BL and BLB drivecomplementary signals during a write operation, and can be driving thesame signal during a pre-charge phase of a read operation, in accordancewith some embodiments.

In some embodiments, signals driven on the plate-lines for bothbit-cells of the differential bit-cell are the same during read andwrite operations. For example, signal driven on PL0_1 is the same assignal driven on PLB0_1 during read and write operations. In one suchexample, signals driven on BL and BLB are complementary signals during awrite operation, and can be driving the same signal during a pre-chargephase of a read operation, in accordance with some embodiments. In someembodiments, PLB0x is complementary to a selected PL for a samebit-cell. For example, PLB0_x is complementary to PL0_2 (selected inthis example) of bit-cell 1321 _(0,0_A). In some embodiments, PL0x iscomplementary to a selected PL for a same bit-cell. For example, PL0_xis complementary to PLB0_2 (selected in this example) of bit-cell 1321_(0,0_B). Depending on the read or write operation, in some embodiments,PL0x is either complementary to PLB0_x or same as PL0_x.

In some embodiments, the switches added to the plate-lines arefabricated in different layers of a die. For example, transistor MN₁ isfabricated on the frontend of the die while transistors MN1_(PLO_1),MN1_(PLO_2), . . . MN1_(PLO_n), and MN1_(PLB_x) are fabricated in thebackend of the die. In some embodiments, transistor MN₂ is fabricated onthe frontend of the die while transistors MN2_(PLO_1), MN2_(PLO_2), . .. MN2_(PLO_n), and MN2_(PLB_x) are fabricated in the backend of the die.

On one such embodiment, the capacitor Cfe is fabricated between thefrontend and the backend of the die. In one example, capacitor Cfe andCd are vertically stacked capacitors. In some embodiments, each switchand its corresponding coupled capacitor is formed in the backend of thedie. In some embodiments, each switch and its corresponding coupledcapacitor is stacked vertically. For example, transistor MN1_(PLO_1) andcapacitor Cfe1 of bit-cell 1321 _(0,0_A) are stacked vertically in afirst vertical stack, and transistor MN1_(PLO_2) and capacitor Cfe2 ofbit-cell 1321 _(0,0_A) are stacked vertically in a second verticalstack. These backed transistors or switches can be fabricated using anysuitable technology such as IGZO (Indium gallium zinc oxide).

FIG. 14A illustrates apparatus 1400 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes multi-element gain and onecompensation capacitor, in accordance with some embodiments. Bit-cell1401 _(0,0) comprises two copies of bit-cell 601 _(0,0), where onebit-cell is complementary to the other. Here, two bit-cells are shown1401 _(0,0_A) and 1401 _(0,0_B), that together form multi-element FEgain differential bit-cell 1401 _(0,0). Both bit-cells share a commonWL, and each bit-cell has its own transistors. In this example,plate-lines PLs are parallel to the word-line WL. In some embodiments,the plate-lines (e.g., PLB0, PLB1, through PLBn) for bit-cell 1401_(0,0_B) are inverse or complementary of the plate-lines (e.g., PL0,PL2, through PLn) for bit-cell 1401 _(0,0_A). The same is true forbit-lines and source or select lines. For example, the bit-line (BLB)for bit-cell 1401 _(0,0_B) is an inverse or complementary of thebit-line (BL) for bit-cell 1401 _(0,0_A), and the select-line (SLB) forbit-cell 1401 _(0,0_B) is inverse or complementary of the select-line(SL) for bit-cell 1401 _(0,0_A). In various embodiments, SL is connectedto transistor MTR₁, which has a gate terminal coupled to storage nodesn1 and a drain or source terminal coupled to a bias voltage Vs.

In some embodiments, the linear dielectric based capacitor Cd1 iscoupled to storage node sn1 and PLB0_x, which is an inverse of the PL(e.g., PL0_1, PL0_2, through PL0_n) of the selected capacitor forbit-cell 1401 _(0,0_A). In some embodiments, the effective capacitanceof the second capacitor Cd1 is equal (or substantially equal) to alinear component of the capacitance of the selected non-linear polarmaterial based capacitor of bit-cell 1401 _(0,0_A). In some embodiments,the linear dielectric based capacitor Cd2 is coupled to storage node sn2and PLB0_x, which is an inverse of the PL (e.g., PL0_1, PL0_2, throughPL0_n) of the selected capacitor for bit cell 1401 _(0,0_B). In someembodiments, the effective capacitance of the second capacitor Cd2 isequal (or substantially equal) to a linear component of the capacitanceof the selected non-linear polar material based capacitor of bit-cell1401 _(0,0_B). In various embodiments, SLB is connected to transistorMTR₂, which has a gate terminal coupled to storage node sn2 and a drainor source terminal coupled to a bias voltage Vs.

While the embodiment of FIG. 14A is illustrated with reference to PLs(e.g., PL0_1, PL0_2, . . . PL0_n) and PLB0_x being parallel to WL, thecommon mode compensation scheme using dielectric capacitors Cd1 and Cd2are also applicable to bit-cells with PLs (e.g., PL0_1, PL0_2, . . .PL0_n) and PLB0_x parallel to the BL and BLB. Likewise, while theembodiments are described with reference to pillar capacitors, both thefirst (Cfe1 and Cfe2) and second (Cd1 and Cd2) capacitors can be planarcapacitors, in accordance with some embodiments.

In some embodiments, signals driven on the plate-lines for bothbit-cells of the differential bit-cell are same during read and writeoperations. For example, signal driven on PL0_1 is same as signal drivenon PLB0_1 during read and write operations. In one such example, signalsdriven on BL and BLB are complementary signals during a write operation,and can be driving the same signal during a pre-charge phase of a readoperation, in accordance with some embodiments. In some embodiments, SLand SLB have same precharge values but complementary values for sensing.

In some embodiments, PLB0x is complementary to a selected PL for a samebit-cell. For example, PLB0_x is complementary to PL0_2 (selected inthis example) of bit-cell 1401 _(0,0_A). In some embodiments, PL0x iscomplementary to a selected PL for a same bit-cell. For example, PL0_xis complementary to PLB0_2 (selected in this example) of bit-cell 1401_(0,0_B). Depending on the read or write operation, in some embodiments,PL0x is either complementary to PLB0_x or same as PL0_x.

FIG. 14B illustrates apparatus 1420 comprising memory and correspondinglogic, wherein the memory comprises non-linear polar material baseddifferential memory bit-cell, where an individual memory bit-cell of thedifferential memory bit-cell includes multi-element gain cells and onecompensation capacitor per cell, and individual transistors for each ofthe capacitors, in accordance with some embodiments.

Bit-cell 1421 _(0,0_A) comprises two copies of bit-cell 621 _(0,0),where one bit-cell is complementary to the other. Here, two bit-cellsare shown 1421 _(0,0_A) and 1421 _(0,0_B), that together form amulti-gain element differential bit-cell 1421 _(0,0). Both bit-cellsshare a common WL, and each bit-cell has its own transistor. Apparatus1420 is like apparatus 1400, but with switches in the path of theplate-lines and hence a different kind of memory bit-cell. Theseswitches are added to remove the charge disturb effect of unselectedbit-cells when bit-lines are arranged parallel to the plate-lines. Thecharge disturb effect here is on the stored state of the capacitors withnon-linear polar material. By adding the switches, the plate-lines areno longer directly affecting the charge disturb effect because of thecorresponding WLs that control the switches.

In some embodiments, each memory bit-cell 1421 in a memory array isorganized in rows and columns, but with bit-lines running parallel tothe plate-lines. For example, memory bit-cells 1421 _(0,0) through 1421_(M,N) (not shown) are organized in an array. In some embodiments, forbit-cell 1421 _(0,0_A), n-type transistor MN1_(PLO_1) is coupled to Cfe1and plate-line PL0_1. In some embodiments, n-type transistor MN1_(PLO_2)is coupled to Cfe2 and plate-line PL0_2. Likewise, in some embodiments,n-type transistor MN1_(PLO_n) is coupled to Cfen and plate-line PLB_n.In some embodiments, n-type transistor MN1_(PLB_x) is coupled tocompensation capacitor Cd and PLB0_x. Each transistor (or switch) iscontrolled separately, in accordance with some embodiments. In someembodiments, transistor MN_(PLO_1) is controllable by WL0_1, transistorMN1_(PLO_2) is controllable by WL0_2, and so on. Likewise, transistorMN1_(PLO_n) is controllable by WL0_n. In some embodiments, transistorMN1_(PLB_X) is controllable by WL0_x. Here, WL0_1 . . . WL0_n are theextensions of an address space. In this case, depending upon whichstorage element is being programmed or read, the corresponding WL0_1 . .. WL0_n are kept high (e.g., Vdd) whenever the plate-line voltage of 0Vor Vdd is applied, while the unselected storage element sees 0V.

In some embodiments, for bit-cell 1421 _(0,0_B), n-type transistorMN2_(PLO_1) is coupled to Cfe1 and plate-line PLB0_1. In someembodiments, n-type transistor MN2_(PLO_2) is coupled to Cfe2 andplate-line PLB0_2. Likewise, in some embodiments, n-type transistorMN2_(PLO_n) is coupled to Cfen and plate-line PLB0_n. In someembodiments, n-type transistor MN2_(PLB_x) is coupled to compensationcapacitor Cd and PL0_x. Each transistor (or switch) is controlledseparately, in accordance with some embodiments. In some embodiments,transistor MN2_(PLO_1) is controllable by WL0_1, transistor MN2_(PLO_2)is controllable by WL0_2, and so on. Likewise, transistor MN2_(PLO_n) iscontrollable by WL0_n. In some embodiments, transistor MN2_(PLB_x) iscontrollable by WL0_x. Here, WL0_1 . . . WL0_n are the extensions of anaddress space. In this case, depending upon which storage element isbeing programmed or read, the corresponding WL0_1 . . . WL0_n are kepthigh (e.g., Vdd) whenever the plate-line voltage of 0V or Vdd isapplied, while the unselected storage element sees 0V.

While the various embodiments are illustrated with reference to ann-type transistors or switches, the embodiments are also applicable to ap-type transistor or a combination of n-type or p-type transistors. Aperson skilled in the art would appreciate that when a transistor of adifferent conductivity type is used, than what is shown in FIG. 14B,then driving logic for BL, PLs, PLB_x, and/or WLs may also change forproper read and/or write operations.

In some embodiments, the plate-lines for bit-cell 1421 _(0,0_A) and forbit-cell 1421 _(0,0_B) may drive the same signals during read or writeoperations. In one such example, signal driven on PL0_1 is the same assignal driven on PLB0_1 during a read operation but are complementary toone another during a write operation. Similarly, BL and BLB drivecomplementary signals during a write operation, and can be driving thesame signal during a pre-charge phase of a read operation, in accordancewith some embodiments.

In some embodiments, signals driven on the plate-lines for bothbit-cells of the differential bit-cell are the same during read andwrite operations. For example, signal driven on PL0_1 is the same assignal driven on PLB0_1 during read and write operations. In one suchexample, signals driven on BL and BLB are complementary signals during awrite operation, and can be driving the same signal during a pre-chargephase of a read operation, in accordance with some embodiments. In someembodiments, PLB0x is complementary to a selected PL for a samebit-cell. For example, PLB0_x is complementary to PL0_2 (selected inthis example) of bit-cell 1421 _(0,0_A). In some embodiments, PL0x iscomplementary to a selected PL for a same bit-cell. For example, PL0_xis complementary to PLB0_2 (selected in this example) of bit-cell 1421_(0,0_B). Depending on the read or write operation, in some embodiments,PL0x is either complementary to PLB0_x or same as PL0_x.

In some embodiments, the switches added to the plate-lines arefabricated in different layers of a die. For example, transistor MN₁ isfabricated on the frontend of the die while transistors MN1_(PLO_1),MN1_(PLO_2), . . . MN1_(PLO_n), and MN1_(PLB_x) are fabricated in thebackend of the die. In some embodiments, transistor MN₂ is fabricated onthe frontend of the die while transistors MN2_(PLO_1), MN2_(PLO_2), . .. MN2_(PLO_n), and MN2_(PLB_x) are fabricated in the backend of the die.

On one such embodiment, the capacitor Cfe is fabricated between thefrontend and the backend of the die. In one example, capacitor Cfe andCd are vertically stacked capacitors. In some embodiments, each switchand its corresponding coupled capacitor is formed in the backend of thedie. In some embodiments, each switch and its corresponding coupledcapacitor is stacked vertically. For example, transistor MN1_(PLO_1) andcapacitor Cfe1 of bit-cell 1421 _(0,0_A) are stacked vertically in afirst vertical stack, and transistor MN1_(PLO_2) and capacitor Cfe2 ofbit-cell 1421 _(0,0_A) are stacked vertically in a second verticalstack. These backed transistors or switches can be fabricated using anysuitable technology such as IGZO (Indium gallium zinc oxide).

FIG. 15 illustrates a high-level architecture of an artificialintelligence (AI) machine comprising a compute die stacked with a memorydie, wherein the compute die includes any one of the bit-cells, inaccordance with some embodiments. AI machine 1500 comprisescomputational block 1501 or processor having random-access memory (RAM)1502 and computational logic 1503; first random-access memory 1504(e.g., static RAM (SRAM), ferroelectric or paraelectric RAM (FeRAM),ferroelectric or paraelectric static random-access memory (FeSRAM)),main processor 1505, second random-access memory 1506 (dynamic RAM(DRAM), FeRAM), and solid-state memory or drive (SSD) 1507. In someembodiments, some or all components of AI machine 1500 are packaged in asingle package forming a system-on-chip (SoC). The SoC can be configuredas a logic-on-logic configuration, which can be in a 3D configuration ora 2.5D configuration.

In some embodiments, computational block 1501 is packaged in a singlepackage and then coupled to processor 1505 and memories 1504, 1506, and1507 on a printed circuit board (PCB). In some embodiments,computational block 1501 is configured as a logic-on-logicconfiguration, which can be in a 3D configuration or a 2.5Dconfiguration. In some embodiments, computational block 1501 comprises aspecial purpose compute die 1503 or microprocessor. For example, computedie 1503 is a compute chiplet that performs a function of an acceleratoror inference. In some embodiments, memory 1502 is DRAM which forms aspecial memory/cache for the special purpose compute die 1503. The DRAMcan be embedded DRAM (eDRAM) such as 1T1C (one transistor and onecapacitor) based memories. In some embodiments, RAM 1502 isferroelectric or paraelectric RAM (Fe-RAM).

In some embodiments, compute die 1503 is specialized for applicationssuch as Artificial Intelligence, graph processing, and algorithms fordata processing. In some embodiments, compute die 1503 further has logiccomputational blocks, for example, for multipliers and buffers, aspecial data memory block (e.g., buffers) comprising DRAM, FeRAM, or acombination of them. In some embodiments, RAM 1502 has weights andinputs stored to improve the computational efficiency. The interconnectsbetween processor 1505 (also referred to as special purpose processor),first RAM 1504 and compute die 1503 are optimized for high bandwidth andlow latency. The architecture of FIG. 15 allows efficient packaging tolower the energy, power, or cost and provides for ultra-high bandwidthbetween RAM 1502 and compute chiplet 1503 of computational block 1501.

In some embodiments, RAM 1502 is partitioned to store input data (ordata to be processed) 1502 a and weight factors 1502 b. In someembodiments, input data 1502 a is stored in a separate memory (e.g., aseparate memory die) and weight factors 1502 b are stored in a separatememory (e.g., separate memory die).

In some embodiments, computational logic or compute chiplet 1503comprises matrix multiplier, adder, concatenation logic, buffers, andcombinational logic. In various embodiments, compute chiplet 1503performs multiplication operation on inputs 1502 a and weights 1502 b.In some embodiments, weights 1502 b are fixed weights. For example,processor 1505 (e.g., a graphics processor unit (GPU), fieldprogrammable grid array (FPGA) processor, application specificintegrated circuit (ASIC) processor, digital signal processor (DSP), anAI processor, a central processing unit (CPU), or any otherhigh-performance processor) computes the weights for a training model.Once the weights are computed, they are stored in memory 1502. Invarious embodiments, the input data that is to be analyzed using atrained model, is processed by computational block 1501 with computedweights 1502 b to generate an output (e.g., a classification result).

In some embodiments, first RAM 1504 is ferroelectric or paraelectricbased SRAM. For example, a six transistor (6T) SRAM bit-cells havingferroelectric or paraelectric transistors are used to implement anon-volatile FeSRAM. In some embodiments, SSD 1507 comprises NAND flashcells. In some embodiments, SSD 1507 comprises NOR flash cells. In someembodiments, SSD 1507 comprises multi-threshold NAND flash cells.

In various embodiments, the non-volatility of FeRAM is used to introducenew features such as security, functional safety, and faster reboot timeof AI machine 1500. The non-volatile FeRAM is a low power RAM thatprovides fast access to data and weights. FeRAM 1504 can also serve as afast storage for computational block 1501 (which can be an inference dieor an accelerator), which typically has low capacity and fast accessrequirements.

In various embodiments, the FeRAM (FeDRAM or FeSRAM) includesferroelectric or paraelectric material. The ferroelectric orparaelectric (FE) material may be in a transistor gate stack or in acapacitor of the memory. The ferroelectric material can be any suitablelow voltage FE material discussed with reference to various embodiments.While embodiments here are described with reference to ferroelectricmaterial, the embodiments are applicable to any of the non-linear polarmaterials described herein.

FIG. 16 illustrates an architecture of a computational block 1600comprising a compute die stacked with a memory die, wherein the computedie includes any one of the memory bit-cells, in accordance with someembodiments. Any of the blocks here can include the bit-cell of variousembodiments. The architecture of FIG. 16 illustrates an architecture fora special purpose compute die where RAM memory buffers for inputs andweights are split on die-1 and logic and optional memory buffers aresplit on die-2.

In some embodiments, memory die (e.g., Die 1) is positioned below acompute die (e.g., Die 2) such that a heat sink or thermal solution isadjacent to the compute die. In some embodiments, the memory die isembedded in an interposer. In some embodiments, the memory die behavesas an interposer in addition to its basic memory function. In someembodiments, the memory die is a high bandwidth memory (HBM) whichcomprises multiple dies of memories in a stack and a controller tocontrol the read and write functions to the stack of memory dies. Insome embodiments, the memory die comprises a first die 1601 to storeinput data and a second die 1602 to store weight factors. In someembodiments, the memory die is a single die that is partitioned suchthat first partition 1601 of the memory die is used to store input dataand second partition 1602 of the memory die is used to store weights. Insome embodiments, the memory die comprises DRAM. In some embodiments,the memory die comprises FE-SRAM or FE-DRAM. In some embodiments, thememory die comprises MRAM. In some embodiments, the memory die comprisesSRAM. For example, memory partitions 1601 and 1602, or memory dies 1601and 1602 include one or more of: DRAM, FE-SRAM, FE-DRAM, SRAM, and/orMRAM. In some embodiments, the input data stored in memory partition ordie 1601 is the data to be analyzed by a trained model with fixedweights stored in memory partition or die 1602.

In some embodiments, the compute die comprises ferroelectric orparaelectric logic (e.g., majority, minority, and/or threshold gates) toimplement matrix multiplier 1603, logic 1604, and temporary buffer 1605.Matrix multiplier 1603 performs multiplication operation on input data‘X’ and weights ‘W’ to generate an output ‘Y’. This output may befurther processed by logic 1604. In some embodiments, logic 1604performs a threshold operation, pooling and drop out operations, and/orconcatenation operations to complete the AI logic primitive functions.

In some embodiments, the output of logic 1604 (e.g., processed output‘Y’) is temporarily stored in buffer 1605. In some embodiments, buffer1605 is memory such as one or more of: DRAM, Fe-SRAM, Fe-DRAM, MRAM,resistive RAM (Re-RAM) and/or SRAM. In some embodiments, buffer 1605 ispart of the memory die (e.g., Die 1). In some embodiments, buffer 1605performs the function of a re-timer. In some embodiments, the output ofbuffer 1605 (e.g., processed output ‘Y’) is used to modify the weightsin memory partition or die 1602. In one such embodiment, computationalblock 1600 not only operates as an inference circuitry, but also as atraining circuitry to train a model. In some embodiments, matrixmultiplier 1603 includes an array of multiplier cells, wherein the DRAMs1601 and 1602 include arrays of memory bit-cells, respectively, whereineach multiplier cell is coupled to a corresponding memory bit-cell ofDRAM 1601 and/or DRAM 1602. In some embodiments, computational block1600 comprises an interconnect fabric coupled to the array of multipliercells such that each multiplier cell is coupled to the interconnectfabric.

Architecture 1600 provides reduced memory access for the compute die(e.g., die 2) by providing data locality for weights, inputs, andoutputs. In one example, data from and to the AI computational blocks(e.g., matrix multiplier 1603) is locally processed within a samepackaging unit. Architecture 1600 also segregates the memory and logicoperations onto a memory die (e.g., Die 1) and a logic die (e.g., Die2), respectively, allowing for optimized AI processing. Desegregateddies allow for improved yield of the dies. A high-capacity memoryprocess for Die 1 allows reduction of power of the externalinterconnects to memory, reduces cost of integration, and results in asmaller footprint.

FIG. 17 illustrates a system-on-chip (SOC) 1700 that uses any one of thememory bit-cells, in accordance with some embodiments. SoC 1700comprises memory 1701 having static random-access memory (SRAM) or FEbased random-access memory FE-RAM, or any other suitable memory. Thememory can be non-volatile (NV) or volatile memory. Memory 1701 may alsocomprise logic 1703 to control memory 1702. For example, write and readdrivers are part of logic 1703. These drivers and other logic areimplemented using the majority or threshold gates of variousembodiments. The logic can comprise majority or threshold gates andtraditional logic (e.g., CMOS based NAND, NOR etc.).

SoC further comprises a memory I/O (input-output) interface 1704. Theinterface may be a double-data rate (DDR) compliant interface or anyother suitable interface to communicate with a processor. Processor 1705of SoC 1700 can be a single core or multiple core processor. Processor1705 can be a general-purpose processor (CPU), a digital signalprocessor (DSP), or an Application Specific Integrated Circuit (ASIC)processor. In some embodiments, processor 1705 is an artificialintelligence (AI) processor (e.g., a dedicated AI processor, a graphicsprocessor configured as an AI processor). In various embodiments,processor 1705 executes instructions that are stored in memory 1701.

AI is a broad area of hardware and software computations where data isanalyzed, classified, and then a decision is made regarding the data.For example, a model describing classification of data for a certainproperty or properties is trained over time with large amounts of data.The process of training a model requires large amounts of data andprocessing power to analyze the data. When a model is trained, weightsor weight factors are modified based on outputs of the model. Onceweights for a model are computed to a high confidence level (e.g., 95%or more) by repeatedly analyzing data and modifying weights to get theexpected results, the model is deemed “trained.” This trained model withfixed weights is then used to make decisions about new data. Training amodel and then applying the trained model for new data is hardwareintensive activity. In some embodiments, the AI processor has reducedlatency of computing the training model and using the training model,which reduces the power consumption of such AI processor systems.

Processor 1705 may be coupled to a number of other chip-lets that can beon the same die as SoC 1700 or on separate dies. These chip-lets includeconnectivity circuitry 1706, I/O controller 1707, power management 1708,and display system 1709, and peripheral connectivity 1706.

Connectivity 1706 represents hardware devices and software componentsfor communicating with other devices. Connectivity 1706 may supportvarious connectivity circuitries and standards. For example,connectivity 1706 may support GSM (global system for mobilecommunications) or variations or derivatives, CDMA (code divisionmultiple access) or variations or derivatives, TDM (time divisionmultiplexing) or variations or derivatives, 3rd Generation PartnershipProject (3GPP) Universal Mobile Telecommunications Systems (UMTS) systemor variations or derivatives, 3GPP Long-Term Evolution (LTE) system orvariations or derivatives, 3GPP LTE-Advanced (LTE-A) system orvariations or derivatives, Fifth Generation (5G) wireless system orvariations or derivatives, 5G mobile networks system or variations orderivatives, 5G New Radio (NR) system or variations or derivatives, orother cellular service standards. In some embodiments, connectivity 1706may support non-cellular standards such as WiFi.

I/O controller 1707 represents hardware devices and software componentsrelated to interaction with a user. I/O controller 1707 is operable tomanage hardware that is part of an audio subsystem and/or displaysubsystem. For example, input through a microphone or other audio devicecan provide input or commands for one or more applications or functionsof SoC 1700. In some embodiments, I/O controller 1707 illustrates aconnection point for additional devices that connect to SoC 1700 throughwhich a user might interact with the system. For example, devices thatcan be attached to the SoC 1700 might include microphone devices,speaker or stereo systems, video systems or other display devices,keyboard or keypad devices, or other I/O devices for use with specificapplications such as card readers or other devices.

Power management 1708 represents hardware or software that perform powermanagement operations, e.g., based at least in part on receivingmeasurements from power measurement circuitries, temperature measurementcircuitries, charge level of battery, and/or any other appropriateinformation that may be used for power management. By using majority andthreshold gates of various embodiments, non-volatility is achieved atthe output of these logic. Power management 1708 may accordingly putsuch logic into low power state without the worry of losing data. Powermanagement may select a power state according to Advanced Configurationand Power Interface (ACPI) specification for one or all components ofSoC 1700.

Display system 1709 represents hardware (e.g., display devices) andsoftware (e.g., drivers) components that provide a visual and/or tactiledisplay for a user to interact with the processor 1705. In someembodiments, display system 1709 includes a touch screen (or touch pad)device that provides both output and input to a user. Display system1709 may include a display interface, which includes the particularscreen or hardware device used to provide a display to a user. In someembodiments, the display interface includes logic separate fromprocessor 1705 to perform at least some processing related to thedisplay.

Peripheral connectivity 1710 may represent hardware devices and/orsoftware devices for connecting to peripheral devices such as printers,chargers, cameras, etc. In some embodiments, peripheral connectivity1710 may support communication protocols, e.g., PCIe (PeripheralComponent Interconnect Express), USB (Universal Serial Bus),Thunderbolt, High-Definition Multimedia Interface (HDMI), Firewire, etc.

In various embodiments, SoC 1700 includes a coherent cache ormemory-side buffer chiplet (not shown) which include ferroelectric orparaelectric memory. The coherent cache or memory-side buffer chipletcan be coupled to processor 1705 and/or memory 1701 according to thevarious embodiments described herein (e.g., via silicon bridge orvertical stacking).

The term “device” may generally refer to an apparatus according to thecontext of the usage of that term. For example, a device may refer to astack of layers or structures, a single structure or layer, a connectionof various structures having active and/or passive elements, etc.Generally, a device is a three-dimensional structure with a plane alongthe x-y direction and a height along the z direction of an x-y-zCartesian coordinate system. The plane of the device may also be theplane of an apparatus, which comprises the device.

Throughout the specification, and in the claims, the term “connected”means a direct connection, such as electrical, mechanical, or magneticconnection between the things that are connected, without anyintermediary devices.

The term “coupled” means a direct or indirect connection, such as adirect electrical, mechanical, or magnetic connection between the thingsthat are connected or an indirect connection, through one or morepassive or active intermediary devices.

The term “adjacent” here generally refers to a position of a thing beingnext to (e.g., immediately next to or close to with one or more thingsbetween them) or adjoining another thing (e.g., abutting it).

The term “circuit” or “module” may refer to one or more passive and/oractive components that are arranged to cooperate with one another toprovide a desired function.

The term “signal” may refer to at least one current signal, voltagesignal, magnetic signal, or data/clock signal. The meaning of “a,” “an,”and “the” include plural references. The meaning of “in” includes “in”and “on.”

Here, the term “analog signal” generally refers to any continuous signalfor which the time varying feature (variable) of the signal is arepresentation of some other time varying quantity, i.e., analogous toanother time varying signal.

Here, the term “digital signal” generally refers to a physical signalthat is a representation of a sequence of discrete values (a quantifieddiscrete-time signal), for example of an arbitrary bit stream, or of adigitized (sampled and analog-to-digital converted) analog signal.

The term “scaling” generally refers to converting a design (schematicand layout) from one process technology to another process technologyand subsequently being reduced in layout area. The term “scaling”generally also refers to downsizing layout and devices within the sametechnology node. The term “scaling” may also refer to adjusting (e.g.,slowing down or speeding up—i.e., scaling down, or scaling uprespectively) of a signal frequency relative to another parameter, forexample, power supply level.

The terms “substantially,” “close,” “approximately,” “near,” and“about,” generally refer to being within +/−10% of a target value. Forexample, unless otherwise specified in the explicit context of theiruse, the terms “substantially equal,” “about equal” and “approximatelyequal” mean that there is no more than incidental variation betweenamong things so described. In the art, such variation is typically nomore than +/−10% of a predetermined target value.

Unless otherwise specified the use of the ordinal adjectives “first,”“second,” and “third,” etc., to describe a common object, merelyindicate that different instances of like objects are being referred toand are not intended to imply that the objects so described must be in agiven sequence, either temporally, spatially, in ranking or in any othermanner.

For the purposes of the present disclosure, phrases “A and/or B” and “Aor B” mean (A), (B), or (A and B). For the purposes of the presentdisclosure, the phrase “A, B, and/or C” means (A), (B), (C), (A and B),(A and C), (B and C), or (A, B and C).

The terms “left,” “right,” “front,” “back,” “top,” “bottom,” “over,”“under,” and the like in the description and in the claims, if any, areused for descriptive purposes and not necessarily for describingpermanent relative positions. For example, the terms “over,” “under,”“front side,” “back side,” “top,” “bottom,” “over,” “under,” and “on” asused herein refer to a relative position of one component, structure, ormaterial with respect to other referenced components, structures ormaterials within a device, where such physical relationships arenoteworthy. These terms are employed herein for descriptive purposesonly and predominantly within the context of a device z-axis andtherefore may be relative to an orientation of a device. Hence, a firstmaterial “over” a second material in the context of a figure providedherein may also be “under” the second material if the device is orientedupside-down relative to the context of the figure provided. In thecontext of materials, one material disposed over or under another may bedirectly in contact or may have one or more intervening materials.Moreover, one material disposed between two materials may be directly incontact with the two layers or may have one or more intervening layers.In contrast, a first material “on” a second material is in directcontact with that second material. Similar distinctions are to be madein the context of component assemblies.

The term “between” may be employed in the context of the z-axis, x-axisor y-axis of a device. A material that is between two other materialsmay be in contact with one or both of those materials, or it may beseparated from both of the other two materials by one or moreintervening materials. A material “between” two other materials maytherefore be in contact with either of the other two materials, or itmay be coupled to the other two materials through an interveningmaterial. A device that is between two other devices may be directlyconnected to one or both of those devices, or it may be separated fromboth of the other two devices by one or more intervening devices.

Here, multiple non-silicon semiconductor material layers may be stackedwithin a single fin structure. The multiple non-silicon semiconductormaterial layers may include one or more “P-type” layers that aresuitable (e.g., offer higher hole mobility than silicon) for P-typetransistors. The multiple non-silicon semiconductor material layers mayfurther include one or more “N-type” layers that are suitable (e.g.,offer higher electron mobility than silicon) for N-type transistors. Themultiple non-silicon semiconductor material layers may further includeone or more intervening layers separating the N-type from the P-typelayers. The intervening layers may be at least partially sacrificial,for example to allow one or more of a gate, source, or drain to wrapcompletely around a channel region of one or more of the N-type andP-type transistors. The multiple non-silicon semiconductor materiallayers may be fabricated, at least in part, with self-aligned techniquessuch that a stacked CMOS device may include both a high-mobility N-typeand P-type transistor with a footprint of a single FET (field effecttransistor).

Here, the term “backend” generally refers to a section of a die which isopposite of a “frontend” and where an IC (integrated circuit) packagecouples to IC die bumps. For example, high-level metal layers (e.g.,metal layer 6 and above in a ten-metal stack die) and corresponding viasthat are closer to a die package are considered part of the backend ofthe die. Conversely, the term “frontend” generally refers to a sectionof the die that includes the active region (e.g., where transistors arefabricated) and low-level metal layers and corresponding vias that arecloser to the active region (e.g., metal layer 5 and below in theten-metal stack die example).

Reference in the specification to “an embodiment,” “one embodiment,”“some embodiments,” or “other embodiments” means that a particularfeature, structure, or characteristic described in connection with theembodiments is included in at least some embodiments, but notnecessarily all embodiments. The various appearances of “an embodiment,”“one embodiment,” or “some embodiments” are not necessarily allreferring to the same embodiments. If the specification states acomponent, feature, structure, or characteristic “may,” “might,” or“could” be included, that particular component, feature, structure, orcharacteristic is not required to be included. If the specification orclaim refers to “a” or “an” element, that does not mean there is onlyone of the elements. If the specification or claims refer to “anadditional” element, that does not preclude there being more than one ofthe additional elements.

Furthermore, the particular features, structures, functions, orcharacteristics may be combined in any suitable manner in one or moreembodiments. For example, a first embodiment may be combined with asecond embodiment anywhere the particular features, structures,functions, or characteristics associated with the two embodiments arenot mutually exclusive.

While the disclosure has been described in conjunction with specificembodiments thereof, many alternatives, modifications and variations ofsuch embodiments will be apparent to those of ordinary skill in the artin light of the foregoing description. The embodiments of the disclosureare intended to embrace all such alternatives, modifications, andvariations as to fall within the broad scope of the appended claims.

In addition, well-known power/ground connections to integrated circuit(IC) chips and other components may or may not be shown within thepresented figures, for simplicity of illustration and discussion, and soas not to obscure the disclosure. Further, arrangements may be shown inblock diagram form to avoid obscuring the disclosure, and also in viewof the fact that specifics with respect to implementation of such blockdiagram arrangements are highly dependent upon the platform within whichthe present disclosure is to be implemented (i.e., such specifics shouldbe well within purview of one skilled in the art). Where specificdetails (e.g., circuits) are set forth to describe example embodimentsof the disclosure, it should be apparent to one skilled in the art thatthe disclosure can be practiced without, or with variation of, thesespecific details. The description is thus to be regarded as illustrativeinstead of limiting.

The structures of various embodiments described herein can also bedescribed as method of forming those structures, and method of operationof these structures.

Following examples are provided that illustrate the various embodiments.The examples can be combined with other examples. As such, variousembodiments can be combined with other embodiments without changing thescope of the invention.

Example 1: An apparatus comprising: a node; a first capacitor comprisingnon-linear polar material, the first capacitor having a first terminalcoupled to the node and a second terminal coupled to a first plate-line;a transistor coupled to the node and a bit-line, wherein the transistoris controllable by a word-line; and a second capacitor coupled to thenode and a second plate-line, wherein the second capacitor comprises alinear dielectric.

Example 2: The apparatus of example 1, wherein an effective capacitanceof the second capacitor is substantially equal to a linear component ofa capacitance of the first capacitor.

Example 3: The apparatus of example 1 comprising one or more circuitriesto apply a voltage on the second plate-line, wherein the voltage on thesecond plate-line is opposite to a voltage applied to the firstcapacitor via the first plate-line to compensate for dielectriccapacitor dependent charge.

Example 4: The apparatus of example 1, wherein the second plate-line hasa voltage complementary to a voltage on the first plate-line.

Example 5: The apparatus of example 1, wherein the first capacitor is apillar capacitor or planar capacitor.

Example 6: The apparatus of example 1, wherein the first capacitor andthe second capacitor are vertically stacked.

Example 7: The apparatus of example 1, wherein the first plate-line andthe second plate-line are parallel to the bit-line.

Example 8: The apparatus of example 1, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 9: The apparatus of example 8, wherein the non-linear polarmaterial includes one of: Bismuth ferrite (BFO), BFO with a dopingmaterial where in the doping material is one of Lanthanum, or elementsfrom lanthanide series of periodic table; Lead zirconium titanate (PZT),or PZT with a doping material, wherein the doping material is one of La,Nb; a relaxor ferroelectric which includes one of lead magnesium niobate(PMN), lead magnesium niobate-lead titanate (PMN-PT), lead lanthanumzirconate titanate (PLZT), lead scandium niobate (PSN), BariumTitanium-Bismuth Zinc Niobium Tantalum (BT-BZNT), or BariumTitanium-Barium Strontium Titanium (BT-BST); a perovskite which includesone of: BaTiO3, PbTiO3, KNbO3, or NaTaO3; a hexagonal ferroelectricwhich includes one of: YMnO3, or LuFeO3; hexagonal ferroelectrics of atype h-RMnO3, where R is a rare earth element which includes one of:cerium (Ce), dysprosium (Dy), erbium (Er), europium (Eu), gadolinium(Gd), holmium (Ho), lanthanum (La), lutetium (Lu), neodymium (Nd),praseodymium (Pr), promethium (Pm), samarium (Sm), scandium (Sc),terbium (Tb), thulium (Tm), ytterbium (Yb), or yttrium (Y); Hafnium(Hf), Zirconium (Zr), Aluminum (Al), Silicon (Si), their oxides or theiralloyed oxides; Hafnium oxides as Hf1-x Ex Oy, where E can be Al, Ca,Ce, Dy, er, Gd, Ge, La, Sc, Si, Sr, Sn, or Y; Al(1-x)Sc(x)N,Ga(1-x)Sc(x)N, Al(1-x)Y(x)N or Al(1-x-y)Mg(x)Nb(y)N, y doped HfO2, wherex includes one of: Al, Ca, Ce, Dy, Er, Gd, Ge, La, Sc, Si, Sr, Sn, or Y,wherein ‘x’ is a fraction; Niobate type compounds LiNbO3, LiTaO3,Lithium iron Tantalum Oxy Fluoride, Barium Strontium Niobate, SodiumBarium Niobate, or Potassium strontium niobate; or an improperferroelectric which includes one of: [PTO/STO]n or [LAO/STO]n, where ‘n’is between 1 to 100.

Example 10: The apparatus of example 8, wherein the paraelectricmaterial includes one of: SrTiO3, Ba(x)Sr(y)TiO3 (where x is −0.5, and yis 0.95), HfZrO2, Hf—Si—O, La-substituted PbTiO3, or PMN-PT basedrelaxor ferroelectrics.

Example 11: The apparatus of example 1, wherein the first capacitorcomprises: a first layer comprising a first conducting material, whereinthe first layer is coupled to the first terminal of the first capacitor;a second layer comprising a second conducting material, wherein thesecond layer is around the first layer; a third layer comprising thenon-linear polar material, wherein the third layer is around the secondlayer; a fourth layer comprising the second conducting material, whereinthe fourth layer is around the third layer; and a fifth layer comprisingthe first conducting material, wherein the first plate-line is partiallycoupled to the fifth layer.

Example 12: The apparatus of example 11, wherein the first layer has afirst circumference, wherein the second layer has a secondcircumference, wherein the third layer has a third circumference,wherein the fourth layer has a fourth circumference, wherein the fifthlayer has a fifth circumference, wherein the fourth circumference islarger than the third circumference, wherein the third circumference islarger than the second circumference, and wherein the secondcircumference is larger than the first circumference.

Example 13: An apparatus comprising: an array of bit-cells organized inrows and columns, wherein an individual bit-cell includes: a storagenode; a first capacitor comprising non-linear polar material, the firstcapacitor having a first terminal coupled to the storage node and asecond terminal coupled to a first plate-line; a transistor coupled tothe storage node and a bit-line, wherein the transistor is controllableby a word-line; and a second capacitor coupled to the storage node and asecond plate-line, wherein the second capacitor comprises a lineardielectric; and a driver circuitry to drive a first voltage on the firstplate-line and to drive a second voltage on the second plate-line,wherein the first voltage is an inverse of the second voltage.

Example 14: The apparatus of example 13, wherein an effectivecapacitance of the second capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor.

Example 15: The apparatus of example 13, wherein the first capacitor andthe second capacitors are pillar capacitors.

Example: 16: The apparatus of example 13, wherein the first capacitorand the second capacitor are vertically stacked.

Example 17: The apparatus of example 13, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 18: The apparatus of example 13, wherein the word-line isparallel to the first plate-line or the second plate-line.

Example 19: A system comprising: a processor circuitry to execute one ormore instructions; a memory to store the one or more instructions; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes an apparatus accordingto any one of examples 1 to 12.

Example 1a: An apparatus comprising: a node; a first capacitorcomprising non-linear polar material, the first capacitor having a firstterminal coupled to the node and a second terminal; a first transistorcoupled to the node and a bit-line, wherein the first transistor iscontrollable by a word-line; a second transistor coupled to the secondterminal of the first capacitor, wherein the second transistor iscoupled to a first plate-line, wherein the second transistor iscontrollable by the word-line; a third transistor coupled to a secondplate-line, wherein the third transistor is controllable by theword-line; and a second capacitor coupled to the node and the thirdtransistor, wherein the second capacitor comprises a linear dielectric.

Example 2a: The apparatus of example 1a, wherein the first plate-lineand the second plate-line are parallel to the bit-line.

Example 3a: The apparatus of example 1a, wherein an effectivecapacitance of the second capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor.

Example 4a: The apparatus of example 1a comprising one or morecircuitries to apply a voltage on the second plate-line, wherein thevoltage on the second plate-line is opposite to a voltage applied to thefirst capacitor via the first plate-line to compensate for dielectriccapacitor dependent charge.

Example 5a: The apparatus of example 1a, wherein the second plate-linehas a voltage complementary to a voltage on the first plate-line.

Example 6a: The apparatus of example 1a, wherein the first capacitor andthe second capacitor are pillar capacitors.

Example 7a: The apparatus of example 1a, wherein the first capacitor andthe second capacitor are planar capacitors.

Example 8a: The apparatus of example 1a, wherein the first capacitor andthe second capacitor are vertically stacked.

Example 9a: The apparatus of example 1a, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 10a: An apparatus comprising: an array of bit-cells organized inrows and columns, wherein an individual bit-cell includes: a storagenode; a first capacitor comprising non-linear polar material, the firstcapacitor having a first terminal coupled to the storage node and asecond terminal; a first transistor coupled to the storage node and abit-line, wherein the first transistor is controllable by a word-line; asecond transistor coupled to the second terminal of the first capacitor,wherein the second transistor is coupled to a first plate-line, whereinthe second transistor is controllable by the word-line; and a secondcapacitor coupled to the storage node and a second plate-line, whereinthe second capacitor comprises a linear dielectric; and a drivercircuitry to drive a first voltage on the first plate-line and to drivea second voltage on the second plate-line, wherein the first voltage isan inverse of the second voltage.

Example 11a: The apparatus of example 10a, wherein the individualbit-cell includes: a third transistor coupled to the second plate-line,wherein the third transistor is controllable by the word-line, whereinthe third transistor is connected to the second capacitor.

Example 12a: The apparatus of example 10a, wherein an effectivecapacitance of the second capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor.

Example 13a: The apparatus of example 10a, wherein the first capacitorand the second capacitor are planar capacitors or pillar capacitors.

Example 14a: The apparatus of example 10a, wherein the first capacitorand the second capacitor are vertically stacked.

Example 15a: The apparatus of example 10a, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 16a: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes a bit-cell whichcomprises: a node; a first capacitor comprising non-linear polarmaterial, the first capacitor having a first terminal coupled to thenode and a second terminal; a first transistor coupled to the node and abit-line, wherein the first transistor is controllable by a word-line; asecond transistor coupled to the second terminal of the first capacitor,wherein the second transistor is coupled to a first plate-line, whereinthe second transistor is controllable by the word-line; a thirdtransistor coupled to a second plate-line, wherein the third transistoris controllable by the word-line; and a second capacitor coupled to thenode and the third transistor, wherein the second capacitor comprises alinear dielectric.

Example 17a: The system of example 16a, wherein the first plate-line andthe second plate-line are parallel to the bit-line.

Example 18a: The system of example 16a, wherein an effective capacitanceof the second capacitor is substantially equal to a linear component ofa capacitance of the first capacitor.

Example 19a: The system of example 16a, wherein the memory comprises oneor more circuitries to apply a voltage on the second plate-line, whereinthe voltage on the second plate-line is opposite to a voltage applied tothe first capacitor via the first plate-line to compensate fordielectric capacitor dependent charge.

Example 20a: The system of example 16a, wherein the second plate-linehas a voltage complementary to a voltage on the first plate-line,wherein the first capacitor and the second capacitor are pillarcapacitors or planar capacitors, and wherein the first capacitor and thesecond capacitor are vertically stacked.

Example 1b: a node; a first capacitor comprising non-linear polarmaterial, the first capacitor having a first terminal coupled to thenode and a second terminal coupled to a first plate-line; a secondcapacitor comprising non-linear polar material, the second capacitorhaving a first terminal coupled to the node and a second terminalcoupled to a second plate-line; a transistor coupled to the node and abit-line, wherein the transistor is controllable by a word-line; and athird capacitor coupled to the node and a third plate-line, wherein thesecond capacitor comprises a linear dielectric.

Example 2b: The apparatus of example 1b, wherein the first plate-line,the second plate-line, and the third plate-line are parallel to theword-line.

Example 3b: The apparatus of example 1b, wherein an effectivecapacitance of the third capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor or the secondcapacitor.

Example 4b: The apparatus of example 1b comprising one or morecircuitries to apply a voltage on the third plate-line, wherein thevoltage on the third plate-line is opposite to a voltage applied to thefirst capacitor via the first plate-line to compensate for dielectriccapacitor dependent charge.

Example 5b: The apparatus of example 1b, wherein the third plate-linehas a voltage complementary to a voltage on the first plate-line.

Example 6b: The apparatus of example 1b, wherein the first capacitor,the second capacitor, and the third capacitor are pillar capacitors orplanar capacitors.

Example 7b: The apparatus of example 1b, wherein the first capacitor,the second capacitor, and the third capacitor are vertically stacked.

Example 8b: The apparatus of example 1b, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 9b: An apparatus comprising: an array of bit-cells organized inrows and columns, wherein an individual bit-cell includes: a node; afirst capacitor comprising non-linear polar material, the firstcapacitor having a first terminal coupled to the node and a secondterminal coupled to a first plate-line; a second capacitor comprisingnon-linear polar material, the second capacitor having a first terminalcoupled to the node and a second terminal coupled to a secondplate-line; a transistor coupled to the node and a bit-line, wherein thetransistor is controllable by a word-line; and a third capacitor coupledto the node and a third plate-line, wherein the second capacitorcomprises a linear dielectric; and a driver circuitry to drive a firstvoltage on the first plate-line and to drive a second voltage on thethird plate-line, wherein the first voltage is an inverse of the secondvoltage.

Example 10b: The apparatus of example 9b, wherein the first plate-line,the second plate-line, and the third plate-line are parallel to theword-line or the bit-line.

Example 11b: The apparatus of example 9b, wherein an effectivecapacitance of the third capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor.

Example 12b: The apparatus of example 9b, wherein the first capacitor,the second capacitor, and the third capacitor are planar capacitors orpillar capacitors.

Example 13b: The apparatus of example 9b, wherein the first capacitor,the second capacitor, and the third capacitor are vertically stacked.

Example 14b: The apparatus of example 9b, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 15b: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes a bit-cell whichcomprises an apparatus according to any one of examples 1b to 8b.

Example 17c: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes an apparatus accordingto any one of examples 8b to 14b.

Example 1c: An apparatus comprising: a node; a first capacitorcomprising non-linear polar material, the first capacitor having a firstterminal coupled to the node and a second terminal coupled to a firstplate-line; a second capacitor comprising non-linear polar material, thesecond capacitor having a first terminal coupled to the node and asecond terminal coupled to a second plate-line; a first transistorcoupled to the node and a bit-line, wherein the first transistor iscontrollable by a word-line; a second transistor coupled to the node anda select-line; and a third capacitor coupled to the node and a thirdplate-line, wherein the third capacitor comprises a linear dielectric.

Example 2c: The apparatus of example 1c, wherein the second transistoris coupled to the node via a gate terminal of the second transistor.

Example 3c: The apparatus of example 1c, wherein the second transistoris coupled to a bias voltage.

Example 4c: The apparatus of example 1c, wherein the first plate-line,the second plate-line, and the third plate-line are parallel to theword-line.

Example 5c: The apparatus of example 1c, wherein an effectivecapacitance of the third capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor or the secondcapacitor.

Example 6c: The apparatus of example 1c comprising one or morecircuitries to apply a voltage on the third plate-line, wherein thevoltage on the third plate-line is opposite to a voltage applied to thefirst capacitor via the first plate-line to compensate for dielectriccapacitor dependent charge.

Example 7c: The apparatus of example 1c, wherein the third plate-linehas a voltage complementary to a voltage on the first plate-line.

Example 8c: The apparatus of example 1c, wherein the first capacitor,the second capacitor, and the third capacitor are pillar capacitors.

Example 9c: The apparatus of example 1c, wherein the first capacitor,the second capacitor, and the third capacitor are planar capacitors.

Example 10c: The apparatus of example 1c, wherein the first capacitor,the second capacitor, and the third capacitor are vertically stacked.

Example 11c: The apparatus of example 1c, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 12c: An apparatus comprising: an array of bit-cells organized inrows and columns, wherein an individual bit-cell includes: a node; afirst capacitor comprising non-linear polar material, the firstcapacitor having a first terminal coupled to the node and a secondterminal coupled to a first plate-line; a second capacitor comprisingnon-linear polar material, the second capacitor having a first terminalcoupled to the node and a second terminal coupled to a secondplate-line; a first transistor coupled to the node and a bit-line,wherein the first transistor is controllable by a word-line; a secondtransistor coupled to the node and a select-line; and a third capacitorcoupled to the node and a third plate-line, wherein the third capacitorcomprises a linear dielectric; and a driver circuitry to drive a firstvoltage on the first plate-line and to drive a second voltage on thethird plate-line, wherein the first voltage is an inverse of the secondvoltage.

Example 13c: The apparatus of example 12c, wherein an effectivecapacitance of the third capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor.

Example 14c: The apparatus of example 12c, wherein the first capacitor,the second capacitor, and the third capacitor are planar capacitors.

Example 15c: The apparatus of example 12c, wherein the first capacitor,the second capacitor, and the third capacitor are vertically stacked.

Example 16c: The apparatus of example 12c, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 17c: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes a bit-cell whichcomprises an apparatus according to any one of examples 1c to 11c.

Example 17c: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes an apparatus accordingto any one of examples 12c to 16c.

Example 1d: An apparatus comprising: a first bit-cell comprising a firsttransistor coupled to a first bit-line and controllable by a word-line,wherein the first transistor is coupled to a first capacitor comprisingnon-linear polar material, wherein the first transistor is coupled to asecond capacitor comprising dielectric material, wherein the firstcapacitor is coupled to a first plate-line, and wherein the secondcapacitor is coupled to a second plate-line; and a second bit-cellcomprising a second transistor coupled to a second bit-line andcontrollable by the word-line, wherein the second transistor is coupledto a third capacitor comprising non-linear polar material, wherein thesecond transistor is coupled to a fourth capacitor comprising dielectricmaterial, wherein the third capacitor is coupled to the firstplate-line, and wherein the fourth capacitor is coupled to the secondplate-line.

Example 2d: The apparatus of example 1d, wherein the first capacitor andthe second capacitor are connected to a first node, which is connectedto the first transistor.

Example 3d: The apparatus of example 1d, wherein the third capacitor andthe fourth capacitor are connected to a second node, which is connectedto the second transistor.

Example 4d: The apparatus of example 1d, wherein the first plate-lineand the second plate-line are parallel to the first bit-line or theword-line.

Example 5d: The apparatus of example 1d, wherein an effectivecapacitance of the second capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor.

Example 6d: The apparatus of example 1d, wherein an effectivecapacitance of the fourth capacitor is substantially equal to a linearcomponent of a capacitance of the third capacitor.

Example 7d: The apparatus of example 1d comprising one or morecircuitries to apply a voltage on the second plate-line, wherein thevoltage on the second plate-line is opposite to a voltage applied to thefirst capacitor or the third capacitor via the first plate-line tocompensate for dielectric capacitor dependent charge.

Example 8d: The apparatus of example 1d, wherein the second plate-linehas a voltage complementary to a voltage on the first plate-line.

Example 9d: The apparatus of example 1d, wherein the first capacitor,the second capacitor, the third capacitor, and the fourth capacitor arepillar capacitors or planar capacitors.

Example 10d: The apparatus of example 1d, wherein the first capacitor,the second capacitor, the third capacitor, and the fourth capacitor arevertically stacked.

Example 11d: The apparatus of example 1d, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 12d: An apparatus comprising: an array of bit-cells organized inrows and columns, wherein an individual bit-cell includes a differentialbit-cell, wherein the differential bit-cell includes two capacitors withnon-linear polar material, and two capacitors with linear dielectric,wherein the two capacitors with non-linear polar material are coupled toa first plate-line, wherein the two capacitors with linear dielectricare coupled to a second plate-line; and a driver circuitry to drive afirst voltage on the first plate-line and to drive a second voltage onthe second plate-line, wherein the first voltage is an inverse of thesecond voltage.

Example 13d: The apparatus of example 12d, wherein an effectivecapacitance of an individual capacitor of the two capacitors with lineardielectric is substantially equal to a linear component of a capacitanceof an individual capacitor of the two capacitors with non-linear polarmaterial.

Example 14d: The apparatus of example 12d, wherein the two capacitorswith linear dielectric and the two capacitors with non-linear polarmaterial are planar capacitors or pillar capacitors.

Example 15d: The apparatus of example 12d, wherein the two capacitorswith linear dielectric and the two capacitors with non-linear polarmaterial are vertically stacked.

Example 16d: The apparatus of example 12d, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 17d: The apparatus of example 12d, wherein the first plate-lineand the second plate-line are parallel to a bit-line or a word-line.

Example 18d: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes a differential bit-cellwhich comprises an apparatus according to any one of examples 1d to 11d.

Example 19d: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes a differential bit-cellwhich comprises an apparatus according to any one of examples 12d to17d.

Example 1e: A method comprising: forming a via extending along ay-plane, wherein the y-plane is orthogonal to an x-plane, wherein thevia couples to a first metal layer; forming a first capacitor includinga non-linear polar material, wherein the first capacitor includes anelectrode coupled to the via, wherein the electrode is in a middle ofthe first capacitor; forming a second capacitor including a lineardielectric material, wherein the electrode passes through a middle ofthe second capacitor; forming a first plate-line extending along thex-plane or a z-plane, wherein the z-plane is orthogonal to the x-planeand the y-plane, wherein the first plate-line is on an outer portion ofthe first capacitor; and forming a second plate-line extending along thex-plane or the z-plane, wherein the second plate-line is on an outputportion of the second capacitor.

Example 2e: The method of example 1e, wherein forming the firstcapacitor includes: forming a first layer coupled to the electrode,wherein the first layer comprises metal; forming a second layer aroundthe first layer, wherein the second layer comprises a first conductiveoxide; forming a third layer comprising the non-linear polar material,wherein the third layer is around the second layer; forming a fourthlayer around the third layer, wherein the fourth layer comprises asecond conductive oxide, wherein the fourth layer is around the thirdlayer; and forming a fifth layer around the fourth layer, wherein thefifth layer comprises metal, wherein the first plate-line is adjacent topart of the fifth layer.

Example 3e: The method of example 2e, wherein: the first layer has afirst circumference; the second layer has a second circumference; thethird layer has a third circumference; the fourth layer has a fourthcircumference; and the fifth layer has a fifth circumference, whereinthe fifth circumference is larger than the fourth circumference, whereinthe fourth circumference is larger than the third circumference, whereinthe third circumference is larger than the second circumference, whereinthe second circumference is larger than the first circumference.

Example 4e: The method of example 1e, wherein forming the secondcapacitor includes: forming a first layer coupled to the electrode,wherein the first layer comprises metal; forming a second layercomprising the linear dielectric material, wherein the second layer isaround the first layer; and forming a third layer around the secondlayer, wherein the third layer comprises metal, wherein the secondplate-line is adjacent to part of the third layer.

Example 5e: The method of example 4e, wherein: the first layer has afirst circumference; the second layer has a second circumference; andthe third layer has a third circumference, wherein the thirdcircumference is larger than the second circumference, wherein thesecond circumference is larger than the first circumference.

Example 6e: The method of example 1e, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 7e: The method of example 1e, wherein the first plate-line andthe second plate-line are parallel to a word-line or a bit-line.

Example 8e: The method of example 1e, wherein an effective capacitanceof the second capacitor is substantially equal to a linear component ofa capacitance of the first capacitor.

Example 9e: The method of example 1e comprising applying a voltage onthe second plate-line, wherein the voltage on the second plate-line isopposite to a voltage applied to the first capacitor via the firstplate-line to compensate for dielectric capacitor dependent charge.

Example 10e: The method of example 1e, wherein the second plate-line hasa voltage complementary to a voltage on the first plate-line.

Example 11e: A method comprising: fabricating a transistor, thetransistor having a source region and a drain region, and a gate;depositing a first etch stop layer over a region above the transistor;fabricating a first via through the first etch stop layer, wherein thefirst via is coupled to the source region; fabricating a second viathrough the first etch stop layer, wherein the second via is coupled tothe drain region; depositing a first metal layer over the first via, thefirst metal layer extending along an x-plane; depositing a second etchstop layer over the first metal layer; forming a third via over thefirst metal layer by etching through the second etch stop layer, thethird via in direct connection to the first metal layer, wherein thethird via extends along a y-plane, wherein the y-plane is orthogonal toan x-plane; forming a first non-planar stack of materials including anon-linear polar material, wherein the first non-planar stack ofmaterials includes an electrode coupled to the third via, wherein theelectrode is in a middle of the first non-planar stack of materials;forming a second non-planar stack of materials including a lineardielectric material, wherein the electrode passes through a middle ofthe second non-planar stack of materials; forming a first plate-lineextending along the x-plane or a z-plane, wherein the z-plane isorthogonal to the x-plane and the y-plane, wherein the first plate-lineis on a portion of the first non-planar stack of materials; and forminga second plate-line extending along the x-plane or the z-plane, whereinthe second plate-line is on a portion of the second non-planar stack ofmaterials.

Example 12e: The method of example 11e, wherein forming the firstnon-planar stack of materials includes: forming a first layer coupled tothe electrode, wherein the first layer comprises metal; forming a secondlayer around the first layer, wherein the second layer comprises a firstconductive oxide; forming a third layer comprising the non-linear polarmaterial, wherein the third layer is around the second layer; forming afourth layer around the third layer, wherein the fourth layer comprisesa second conductive oxide, wherein the fourth layer is around the thirdlayer; and forming a fifth layer around the fourth layer, wherein thefifth layer comprises metal, wherein the first plate-line is adjacent topart of the fifth layer.

Example 13e: The method of example 12e, wherein: the first layer has afirst circumference; the second layer has a second circumference; thethird layer has a third circumference; the fourth layer has a fourthcircumference; and the fifth layer has a fifth circumference, whereinthe fifth circumference is larger than the fourth circumference, whereinthe fourth circumference is larger than the third circumference, whereinthe third circumference is larger than the second circumference, whereinthe second circumference is larger than the first circumference.

Example 14e: The method of example 11e, wherein the first non-planarstack of materials and the second non-planar stack of materials arecylindrical in shape, or wherein the first non-planar stack of materialsand the second non-planar stack of materials are square or square-likein shape.

Example 15e: The method of example 11e, wherein an effective capacitanceof the second non-planar stack of materials is substantially equal to alinear component of a capacitance of the first non-planar stack ofmaterials.

Example 16e: The method of example 11e comprising applying a voltage onthe second plate-line, wherein the voltage on the second plate-line isopposite to a voltage applied to the first non-planar stack of materialsvia the first plate-line to compensate for dielectric capacitordependent charge.

Example 17e: The method of example 11e, wherein the second plate-linehas a voltage complementary to a voltage on the first plate-line.

Example 18e: A method comprising: forming a memory; storing one or moreinstructions on the memory; executing, by a processor circuitry, the oneor more instructions; and allowing, via a communication interface, theprocessor circuitry to communicate with another device, wherein formingthe memory includes a method according to any one of examples 1e to 10e.

Example 18e: A method comprising: forming a memory; storing one or moreinstructions on the memory; executing, by a processor circuitry, the oneor more instructions; and allowing, via a communication interface, theprocessor circuitry to communicate with another device, wherein formingthe memory includes a method according to any one of examples 11e to17e.

Example 1f: A method comprising: forming a first metal layer extendingalong an x-plane; forming a second metal layer extending along thex-plane, wherein the second metal layer is above the first metal layer;forming a first via extending along a y-plane, wherein the y-plane isorthogonal to the x-plane, wherein the first via couples the first metallayer with the second metal layer; forming a second via extending alongthe y-plane, wherein the second via couples the second metal layer,wherein the second via is above the first via; forming a first pedestalon the first metal layer, wherein the first pedestal is laterally offsetfrom the first via; forming a second pedestal on the second metal layer,wherein the second pedestal is laterally offset from the second via;forming a first plate-line extending along a z-plane, wherein thez-plane is orthogonal to the x-plane and the y-plane; forming a secondplate-line extending along the z-plane; forming a first planar stack ofmaterials including a non-linear polar material, wherein the firstplanar stack of materials has a top electrode and a bottom electrode,wherein the non-linear polar material is between the top electrode andthe bottom electrode, wherein the bottom electrode is on the firstpedestal, wherein the first plate-line is on the top electrode; andforming a second planar stack of materials including a linear dielectricmaterial, wherein the second planar stack of materials has a topelectrode and a bottom electrode, wherein the linear dielectric materialis between the top electrode of the second planar stack of materials andthe bottom electrode and the second planar stack of materials, whereinthe bottom electrode is on the second pedestal, wherein the secondplate-line on the top electrode.

Example 2f: The method of example 1, wherein the first plate-line andthe second plate-line are parallel to a word-line or a bit-line.

Example 3f: The method of example 1, wherein an effective capacitance ofthe second planar stack of materials is substantially equal to a linearcomponent of a capacitance of the first planar stack of materials.

Example 4f: The method of example 1 comprising applying a voltage on thesecond plate-line, wherein the voltage on the second plate-line isopposite to a voltage applied to the first planar stack of materials viathe first plate-line to compensate for dielectric capacitor dependentcharge.

Example 5f: The method of example 1, wherein the second plate-line has avoltage complementary to a voltage on the first plate-line.

Example 6f: The method of example 1, wherein forming the second planarstack of materials includes: forming a first layer coupled to the bottomelectrode, wherein the first layer comprises metal; forming a secondlayer comprising the linear dielectric material, wherein the secondlayer on the first layer; and forming a third layer on the second layer,wherein the third layer comprises metal and is coupled to the topelectrode of the second planar stack of materials.

Example 7f: The method of example 1, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 8f: A method comprising: fabricating a transistor, thetransistor having a source region and a drain region, and a gate;depositing a first etch stop layer over a region above the transistor;fabricating a first via through the first etch stop layer, wherein thefirst via is coupled to the source region; fabricating a second viathrough the first etch stop layer, wherein the second via is coupled tothe drain region; depositing a first metal layer over the first via, thefirst metal layer extending along an x-plane; depositing a second etchstop layer over the first metal layer; forming a third via over thefirst metal layer by etching through the second etch stop layer, thethird via in direct connection to the first metal layer; depositing asecond metal layer extending along the x-plane, wherein the second metallayer is above the first metal layer, wherein the second metal layercouples the third via; depositing an interlayer dielectric between thefirst metal layer and the second metal layer; depositing a third etchstop layer of the second metal layer; etching through the third etchstop layer to form a first pedestal filled with metal, wherein the firstpedestal is coupled to the second metal layer; depositing a firstplurality of layers to form a first planar capacitor, wherein the firstplurality of layers includes non-linear polar material, wherein a firstlayer of the first plurality of layers is in contact with a top portionof the first pedestal; depositing a fourth etch stop layer over a lastlayer of the first plurality of layers; etching through the fourth etchstop layer and the third etch stop layer to form a fourth via in directconnection to the second metal layer; depositing a third metal layerover the fourth via, wherein the first plurality of layers is betweenthe second metal layer and the third metal layer; etching through thefourth etch stop layer to form a second pedestal filled with metal,wherein the second pedestal is coupled to the third metal layer; anddepositing a second plurality of layers to form a second planarcapacitor, wherein the second plurality of layers includes a lineardielectric material, wherein a first layer of the second plurality oflayers is in direct contact with a top portion of the second pedestal.

Example 9f: The method of example 8f comprising: depositing a fifth etchstop layer over a last layer of the second plurality of layers; andetching through the fifth etch stop layer and the fourth etch stop layerto form a fifth via in direct connection to the third metal layer,wherein the fifth via is substantially above the fourth via.

Example 10f: The method of example 8f, wherein the last layer of thefirst plurality of layers is coupled to a first plate-line, wherein alast layer of the second plurality of layers is coupled to a secondplate-line, wherein the first plate-line and the second plate-line areparallel to a word-line or a bit-line.

Example 11f: The method of example 8f, wherein an effective capacitanceof the second plurality of layers is substantially equal to a linearcomponent of a capacitance of the first plurality of layers.

Example 12f: The method of example 10f comprising applying a voltage onthe second plate-line, wherein the voltage on the second plate-line isopposite to a voltage applied to the first plurality of layers via thefirst plate-line to compensate for dielectric capacitor dependentcharge.

Example 13f: The method of example 12, wherein the second plate-line hasa voltage complementary to a voltage on the first plate-line.

Example 14f: The method of example 12, wherein forming the secondplurality of layers includes: forming the first layer coupled to the topportion of the first pedestal, wherein the first layer comprises metal;forming a second layer comprising the linear dielectric material,wherein the second layer on the first layer; and forming the last layerof the second plurality of layers on the second layer, wherein the lastlayer comprises metal and is coupled to the second plate-line of thesecond plurality of layers.

Example 15f: The method of example 8f, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 16f: A method comprising: forming a memory; storing one or moreinstructions on the memory; executing, by a processor circuitry, the oneor more instructions; and allowing, via a communication interface, theprocessor circuitry to communicate with another device, wherein formingthe memory comprises a method according to any one of examples 1f to 7f.

Example 16f: A method comprising: forming a memory; storing one or moreinstructions on the memory; executing, by a processor circuitry, the oneor more instructions; and allowing, via a communication interface, theprocessor circuitry to communicate with another device, wherein formingthe memory comprises a method according to any one of examples 8f to15f.

Example 1g: An apparatus comprising: a via extending along a y-plane,wherein the y-plane is orthogonal to an x-plane, wherein the via couplesto a first metal layer; a first capacitor including a non-linear polarmaterial, wherein the first capacitor includes an electrode coupled tothe via, wherein the electrode is in a middle of the first capacitor; asecond capacitor including a linear dielectric material, wherein theelectrode passes through a middle of the second capacitor; a firstplate-line extending along the x-plane or a z-plane, wherein the z-planeis orthogonal to the x-plane and the y-plane, wherein the firstplate-line is on an outer portion of the first capacitor; and a secondplate-line extending along the x-plane or the z-plane, wherein thesecond plate-line is on an output portion of the second capacitor.

Example 2g: The apparatus of example 1g, wherein the first capacitorincludes: a first layer coupled to the electrode, wherein the firstlayer comprises metal; a second layer around the first layer, whereinthe second layer comprises a first conductive oxide; a third layercomprising the non-linear polar material, wherein the third layer isaround the second layer; a fourth layer around the third layer, whereinthe fourth layer comprises a second conductive oxide, wherein the fourthlayer is around the third layer; and a fifth layer around the fourthlayer, wherein the fifth layer comprises metal, wherein the firstplate-line is adjacent to part of the fifth layer.

Example 3g: The apparatus of example 2g, wherein: the first layer has afirst circumference; the second layer has a second circumference; thethird layer has a third circumference; the fourth layer has a fourthcircumference; and the fifth layer has a fifth circumference, whereinthe fifth circumference is larger than the fourth circumference, whereinthe fourth circumference is larger than the third circumference, whereinthe third circumference is larger than the second circumference, whereinthe second circumference is larger than the first circumference.

Example 4g: The apparatus of example 1g, wherein the second capacitorincludes: a first layer coupled to the electrode, wherein the firstlayer comprises metal; a second layer comprising the linear dielectricmaterial, wherein the second layer is around the first layer; and athird layer around the second layer, wherein the third layer comprisesmetal, wherein the second plate-line is adjacent to part of the thirdlayer.

Example 5g: The apparatus of example 4, wherein: the first layer has afirst circumference; the second layer has a second circumference; andthe third layer has a third circumference, wherein the thirdcircumference is larger than the second circumference, wherein thesecond circumference is larger than the first circumference.

Example 6g: The apparatus of example 1g, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 7g: The apparatus of example 1g, wherein the first plate-lineand the second plate-line are parallel to a word-line or a bit-line.

Example 8g: The apparatus of example 1g, wherein an effectivecapacitance of the second capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor.

Example 9g: The apparatus of example 1g comprising circuitry to apply avoltage on the second plate-line, wherein the voltage on the secondplate-line is opposite to a voltage applied to the first capacitor viathe first plate-line to compensate for dielectric capacitor dependentcharge.

Example 10g: The apparatus of example 1g, wherein the second plate-linehas a voltage complementary to a voltage on the first plate-line.

Example 11g: An apparatus comprising: a transistor, the transistorhaving a source region and a drain region, and a gate; a first viacoupled to the source region; a second via coupled to the drain region;a first metal layer over the first via, the first metal layer extendingalong an x-plane; a third via over the first metal layer, the third viain direct connection to the first metal layer, wherein the third viaextends along a y-plane, wherein the y-plane is orthogonal to anx-plane; a first non-planar stack of materials including a non-linearpolar material, wherein the first non-planar stack of materials includesan electrode coupled to the third via, wherein the electrode is in amiddle of the first non-planar stack of materials; a second non-planarstack of materials including a linear dielectric material, wherein theelectrode passes through a middle of the second non-planar stack ofmaterials; a first plate-line extending along the x-plane or a z-plane,wherein the z-plane is orthogonal to the x-plane and the y-plane,wherein the first plate-line is on a portion of the first non-planarstack of materials; and a second plate-line extending along the x-planeor the z-plane, wherein the second plate-line is on a portion of thesecond non-planar stack of materials.

Example 12g: The apparatus of example 11g, wherein the first non-planarstack of materials includes: a first layer coupled to the electrode,wherein the first layer comprises metal; a second layer around the firstlayer, wherein the second layer comprises a first conductive oxide; athird layer comprising the non-linear polar material, wherein the thirdlayer is around the second layer; a fourth layer around the third layer,wherein the fourth layer comprises a second conductive oxide, whereinthe fourth layer is around the third layer; and a fifth layer around thefourth layer, wherein the fifth layer comprises metal, wherein the firstplate-line is adjacent to part of the fifth layer.

Example 13g: The apparatus of example 12g, wherein: the first layer hasa first circumference; the second layer has a second circumference; thethird layer has a third circumference; the fourth layer has a fourthcircumference; and the fifth layer has a fifth circumference, whereinthe fifth circumference is larger than the fourth circumference, whereinthe fourth circumference is larger than the third circumference, whereinthe third circumference is larger than the second circumference, whereinthe second circumference is larger than the first circumference.

Example 14g: The apparatus of example 11g, wherein the first non-planarstack of materials and the second non-planar stack of materials arecylindrical in shape, or wherein the first non-planar stack of materialsand the second non-planar stack of materials are square or square-likein shape.

Example 15g: The apparatus of example 11g, wherein an effectivecapacitance of the second non-planar stack of materials is substantiallyequal to a linear component of a capacitance of the first non-planarstack of materials.

Example 16g: The apparatus of example 11g comprising circuitry to applya voltage on the second plate-line, wherein the voltage on the secondplate-line is opposite to a voltage applied to the first non-planarstack of materials via the first plate-line to compensate for dielectriccapacitor dependent charge.

Example 17g: The apparatus of example 11g, wherein the second plate-linehas a voltage complementary to a voltage on the first plate-line.

Example 18g: A system comprising: a memory to store one or moreinstructions on the memory; a processor circuitry to execute the one ormore instructions; and a communication interface to allow the processorcircuitry to communicate with another device, wherein the memoryincludes an apparatus according to any one of examples 1g to 10g.

Example 19g: A system comprising: a memory to store one or moreinstructions on the memory; a processor circuitry to execute the one ormore instructions; and a communication interface to allow the processorcircuitry to communicate with another device, wherein the memoryincludes an apparatus according to any one of examples 11g to 17g.

Example 1h: An apparatus comprising: a first metal layer extending alongan x-plane; a second metal layer extending along the x-plane, whereinthe second metal layer is above the first metal layer; a first viaextending along a y-plane, wherein the y-plane is orthogonal to thex-plane, wherein the first via couples the first metal layer with thesecond metal layer; a second via extending along the y-plane, whereinthe second via couples the second metal layer, wherein the second via isabove the first via; a first pedestal on the first metal layer, whereinthe first pedestal is laterally offset from the first via; a secondpedestal on the second metal layer, wherein the second pedestal islaterally offset from the second via; a first plate-line extending alonga z-plane, wherein the z-plane is orthogonal to the x-plane and they-plane; a second plate-line extending along the z-plane; a first planarstack of materials including a non-linear polar material, wherein thefirst planar stack of materials has a top electrode and a bottomelectrode, wherein the non-linear polar material is between the topelectrode and the bottom electrode, wherein the bottom electrode is onthe first pedestal, wherein the first plate-line is on the topelectrode; and a second planar stack of materials including a lineardielectric material, wherein the second planar stack of materials has atop electrode and a bottom electrode, wherein the linear dielectricmaterial is between the top electrode of the second planar stack ofmaterials and the bottom electrode and the second planar stack ofmaterials, wherein the bottom electrode is on the second pedestal,wherein the second plate-line on the top electrode.

Example 2h: The apparatus of example 1h, wherein the first plate-lineand the second plate-line are parallel to a word-line or a bit-line.

Example 3h: The apparatus of example 1h, wherein an effectivecapacitance of the second planar stack of materials is substantiallyequal to a linear component of a capacitance of the first planar stackof materials.

Example 4h: The apparatus of example 1h comprising circuitry to apply avoltage on the second plate-line, wherein the voltage on the secondplate-line is opposite to a voltage applied to the first planar stack ofmaterials via the first plate-line to compensate for dielectriccapacitor dependent charge.

Example 5h: The apparatus of example 1h, wherein the second plate-linehas a voltage complementary to a voltage on the first plate-line.

Example 6h: The apparatus of example 1h, wherein the second planar stackof materials includes: a first layer coupled to the bottom electrode,wherein the first layer comprises metal; a second layer comprising thelinear dielectric material, wherein the second layer on the first layer;and a third layer on the second layer, wherein the third layer comprisesmetal and is coupled to the top electrode of the second planar stack ofmaterials.

Example 7h: The apparatus of example 1h, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 8h: A apparatus comprising: a transistor, the transistor havinga source region and a drain region, and a gate; a first via is coupledto the source region; a second via is coupled to the drain region; afirst metal layer over the first via, the first metal layer extendingalong an x-plane; a second etch stop layer over the first metal layer; athird via over the first metal layer by etching through the second etchstop layer, the third via in direct connection to the first metal layer;a second metal layer extending along the x-plane, wherein the secondmetal layer is above the first metal layer, wherein the second metallayer couples the third via; an interlayer dielectric between the firstmetal layer and the second metal layer; a first pedestal filled withmetal, wherein the first pedestal is coupled to the second metal layer;a first plurality of layers to form a first planar capacitor, whereinthe first plurality of layers includes non-linear polar material,wherein a first layer of the first plurality of layers is in contactwith a top portion of the first pedestal; a fourth via in directconnection to the second metal layer; a third metal layer over thefourth via, wherein the first plurality of layers is between the secondmetal layer and the third metal layer; a second pedestal filled withmetal, wherein the second pedestal is coupled to the third metal layer;and a second plurality of layers to form a second planar capacitor,wherein the second plurality of layers includes a linear dielectricmaterial, wherein a first layer of the second plurality of layers is indirect contact with a top portion of the second pedestal.

Example 9h: The apparatus of example 8h comprising a fifth via in directconnection to the third metal layer, wherein the fifth via issubstantially above the fourth via.

Example 10h: The apparatus of example 9h, wherein a last layer of thefirst plurality of layers is coupled to a first plate-line, wherein alast layer of the second plurality of layers is coupled to a secondplate-line, wherein the first plate-line and the second plate-line areparallel to a word-line or a bit-line.

Example 11h: The apparatus of example 8h, wherein an effectivecapacitance of the second plurality of layers is substantially equal toa linear component of a capacitance of the first plurality of layers.

Example 12h: The apparatus of example 10h comprising circuitry to applya voltage on the second plate-line, wherein the voltage on the secondplate-line is opposite to a voltage applied to the first plurality oflayers via the first plate-line to compensate for dielectric capacitordependent charge.

Example 13h: The apparatus of example 10h, wherein the second plate-linehas a voltage complementary to a voltage on the first plate-line.

Example 14h: The apparatus of example 10h, wherein the second pluralityof layers includes: the first layer coupled to the top portion of thefirst pedestal, wherein the first layer comprises metal; a second layercomprising the linear dielectric material, wherein the second layer onthe first layer; and the last layer of the second plurality of layers onthe second layer, wherein the last layer comprises metal and is coupledto the second plate-line of the second plurality of layers.

Example 15h: The apparatus of example 8h, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 16h: A system comprising: a memory to store one or moreinstructions on the memory; a processor circuitry to execute the one ormore instructions; and a communication interface to allow the processorcircuitry to communicate with another device, wherein the memoryincludes an apparatus according to examples 1h to 7h.

Example 17h: A system comprising: a memory to store one or moreinstructions on the memory; a processor circuitry to execute the one ormore instructions; and a communication interface to allow the processorcircuitry to communicate with another device, wherein the memoryincludes an apparatus according to examples 8h to 16h.

Example 1i: An apparatus comprising: a first bit-cell comprising a firsttransistor coupled to a first bit-line and controllable by a word-line,wherein the first transistor is coupled to: a first capacitor comprisinga non-linear polar material; a second capacitor comprising thenon-linear polar material, and a third capacitor comprising linear alinear dielectric material, wherein the first capacitor is coupled to afirst plate-line, wherein the second capacitor is coupled to a secondplate-line, wherein the third capacitor is coupled to a thirdplate-line; and a second bit-cell comprising a second transistor coupledto a second bit-line and controllable by the word-line, wherein thesecond transistor is coupled to: a fourth capacitor comprising thenon-linear polar material, a fifth capacitor comprising the non-linearpolar material, and a sixth capacitor comprising the linear dielectricmaterial, wherein the fourth capacitor is coupled to a fourthplate-line, wherein the fifth capacitor is coupled to a fifthplate-line, wherein the sixth capacitor is coupled to a sixthplate-line.

Example 2i: The apparatus of example 1i, wherein the first plate-lineand the second plate-line are parallel to the first bit-line or theword-line.

Example 3i: The apparatus of example 1i, wherein an effectivecapacitance of the third capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor or the secondcapacitor.

Example 4i: The apparatus of example 1i, wherein an effectivecapacitance of the sixth capacitor is substantially equal to a linearcomponent of a capacitance of the fourth capacitor or the fifthcapacitor.

Example 5i: The apparatus of example 1i comprising one or morecircuitries to apply a voltage on the third plate-line, wherein thevoltage on the third plate-line is opposite to a voltage applied to thefourth capacitor via the fourth plate-line to compensate for dielectriccapacitor dependent charge.

Example 6i: The apparatus of example 1i, wherein the sixth plate-linehas a voltage complementary to a voltage on the first plate-line.

Example 7i: The apparatus of example 1i, wherein the first capacitor,the second capacitor, the third capacitor, the fourth capacitor, thefifth capacitor, and the sixth capacitor are pillar capacitors or planarcapacitors.

Example 8i: The apparatus of example 1i, wherein the first capacitor,the second capacitor, and the third capacitor are vertically stacked ina first stack, wherein the fourth capacitor, the fifth capacitor, andthe sixth capacitor are vertically stacked in a second stack.

Example 9i: The apparatus of example 1i, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 10i: An apparatus comprising: an array of bit-cells organized inrows and columns, wherein an individual bit-cell includes a differentialbit-cell, wherein the differential bit-cell includes four capacitorswith non-linear polar material, and two capacitors with lineardielectric material, wherein the four capacitors with non-linear polarmaterial are coupled to a first individual plate-lines, respectively,wherein the two capacitors with linear dielectric are coupled to secondindividual plate-lines; and a driver circuitry to drive a first voltageon a first individual plate-line, of the first individual plate-lines,coupled to a first capacitor of the four capacitors, wherein the drivercircuitry is to drive a second voltage on a second individualplate-line, of the second individual plate-lines, coupled to a firstcapacitor of the two capacitors, wherein the first voltage is an inverseof the second voltage.

Example 11i: The apparatus of example 10i, wherein an effectivecapacitance of an individual first capacitor of the two capacitors withlinear dielectric is substantially equal to a linear component of acapacitance of an individual capacitor of the four capacitors withnon-linear polar material.

Example 12i: The apparatus of example 10i, wherein the two capacitorswith linear dielectric and the four capacitors with non-linear polarmaterial are planar capacitors or pillar capacitors.

Example 13i: The apparatus of example 10i, wherein the two capacitorswith linear dielectric and the four capacitors with non-linear polarmaterial are vertically stacked such that a first capacitor of the twocapacitors and two first capacitors of the four capacitors are in afirst vertical stack, and a second capacitor of the two capacitors andtwo second capacitors of the four capacitors are in a second verticalstack.

Example 14i: The apparatus of example 10i, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 16i: The apparatus of example 10i, wherein the first individualplate-line and the second individual plate-line are parallel to abit-line or a word-line.

Example 17i: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes a differential bit-cellwhich comprises an apparatus according to any one of examples 1i to 9i.

Example 17i: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes a differential bit-cellwhich comprises an apparatus according to any one of examples 10i to17i.

Example 1j: An apparatus comprising: a first bit-cell comprising: afirst transistor coupled to a first bit-line and controllable by aword-line; and a second transistor coupled to a first select-line andthe first transistor, wherein the first transistor and the secondtransistor are coupled to: a first capacitor comprising a non-linearpolar material, a second capacitor comprising the non-linear polarmaterial, and a third capacitor comprising linear a linear dielectricmaterial, wherein the first capacitor is coupled to a first plate-line,wherein the second capacitor is coupled to a second plate-line, whereinthe third capacitor is coupled to a third plate-line; and a secondbit-cell comprising: a third transistor coupled to a second bit-line andcontrollable by the word-line; a fourth transistor coupled to a secondselect-line and the third transistor, wherein the third transistor andthe fourth transistor are coupled to: a fourth capacitor comprising thenon-linear polar material, a fifth capacitor comprising the non-linearpolar material, and a sixth capacitor comprising the linear dielectricmaterial, wherein the fourth capacitor is coupled to a fourthplate-line, wherein the fifth capacitor is coupled to a fifthplate-line, wherein the sixth capacitor is coupled to a sixthplate-line.

Example 2j: The apparatus of example 1j, wherein the first plate-lineand the second plate-line are parallel to the first bit-line or theword-line.

Example 3j: The apparatus of example 1j, wherein an effectivecapacitance of the third capacitor is substantially equal to a linearcomponent of a capacitance of the first capacitor or the secondcapacitor.

Example 4j: The apparatus of example 1j, wherein an effectivecapacitance of the sixth capacitor is substantially equal to a linearcomponent of a capacitance of the fourth capacitor or the fifthcapacitor.

Example 5j: The apparatus of example 1j comprising one or morecircuitries to apply a voltage on the third plate-line, wherein thevoltage on the third plate-line is opposite to a voltage applied to thefirst capacitor via the first plate-line to compensate for dielectriccapacitor dependent charge.

Example 6j: The apparatus of example 1j, wherein the sixth plate-linehas a voltage complementary to a voltage on the fourth plate-line.

Example 7j: The apparatus of example 1j, wherein the first capacitor,the second capacitor, the third capacitor, the fourth capacitor, thefifth capacitor, and the sixth capacitor are pillar capacitors or planarcapacitors.

Example 8j: The apparatus of example 1j, wherein the first capacitor,the second capacitor, and the third capacitor are vertically stacked ina first stack, wherein the fourth capacitor, the fifth capacitor, andthe sixth capacitor are vertically stacked in a second stack.

Example 9j: The apparatus of example 1j, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 10j: The apparatus of example 1j, wherein the second transistoris coupled to a first bias, wherein the fourth transistor is coupled toa second bias.

Example 11j: An apparatus comprising: an array of bit-cells organized inrows and columns, wherein an individual bit-cell includes a differentialbit-cell, wherein the differential bit-cell includes: a firstmulti-element gain bit-cell having a first plurality of capacitors withnon-linear polar material, and a first capacitor with linear dielectricmaterial; and a second multi-element gain bit-cell having a secondplurality of capacitors with non-linear polar material, and a secondcapacitor with linear dielectric material; and a driver circuitry todrive a first voltage on a first individual plate-line coupled to acapacitor of the first plurality of capacitors, wherein the drivercircuitry is to drive a second voltage on a second individual plate-linecoupled to the first capacitor, wherein the first voltage is an inverseof the second voltage.

Example 12j: The apparatus of example 11j, wherein the driver circuitryis to drive a third voltage on a third individual plate-line coupled toa capacitor of the second plurality of capacitors, wherein the drivercircuitry is to drive a fourth voltage on a fourth individual plate-linecoupled to the second capacitor, wherein the third voltage is an inverseof the fourth voltage.

Example 13j: The apparatus of example 12j, wherein the first individualplate-line and the second individual plate-line are parallel to abit-line or a word-line.

Example 14j: The apparatus of example 11j, wherein the first capacitorand the second capacitor with linear dielectric and the first pluralityof capacitors with non-linear polar material and the second plurality ofcapacitors are planar capacitors or pillar capacitors.

Example 15j: The apparatus of example 11j, wherein the first capacitorwith linear dielectric and the first plurality of capacitors withnon-linear polar material are vertically stacked in a first verticalstack, and the second capacitor with linear dielectric and the secondplurality of capacitors with non-linear polar material are verticallystacked in a second vertical stack.

Example 17j: The apparatus of example 11j, wherein the non-linear polarmaterial includes one of: ferroelectric material, paraelectric material,or non-linear dielectric.

Example 18j: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes a differential bit-cellwhich comprises an apparatus according to any one of examples 1j to 10j.

Example 18j: A system comprising: a processor circuitry to execute oneor more instructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes a differential bit-cellwhich comprises an apparatus according to any one of examples 11j to17j.

An abstract is provided that will allow the reader to ascertain thenature and gist of the technical disclosure. The abstract is submittedwith the understanding that it will not be used to limit the scope ormeaning of the claims. The following claims are hereby incorporated intothe detailed description, with each claim standing on its own as aseparate embodiment.

We claim:
 1. An apparatus comprising: a first bit-cell comprising afirst transistor coupled to a first bit-line and controllable by aword-line, wherein the first transistor is coupled to a first capacitorcomprising non-linear polar material, wherein the first transistor iscoupled to a second capacitor comprising dielectric material, whereinthe first capacitor is coupled to a first plate-line, and wherein thesecond capacitor is coupled to a second plate-line; and a secondbit-cell comprising a second transistor coupled to a second bit-line andcontrollable by the word-line, wherein the second transistor is coupledto a third capacitor comprising the non-linear polar material, whereinthe second transistor is coupled to a fourth capacitor comprising thedielectric material, wherein the third capacitor is coupled to the firstplate-line, and wherein the fourth capacitor is coupled to the secondplate-line.
 2. The apparatus of claim 1, wherein the first capacitor andthe second capacitor are connected to a first node, which is connectedto the first transistor.
 3. The apparatus of claim 1, wherein the thirdcapacitor and the fourth capacitor are connected to a second node, whichis connected to the second transistor.
 4. The apparatus of claim 1,wherein the first plate-line and the second plate-line are parallel tothe first bit-line or the word-line.
 5. The apparatus of claim 1,wherein an effective capacitance of the second capacitor issubstantially equal to a linear component of a capacitance of the firstcapacitor.
 6. The apparatus of claim 1, wherein an effective capacitanceof the fourth capacitor is substantially equal to a linear component ofa capacitance of the third capacitor.
 7. The apparatus of claim 1comprising one or more circuitries to apply a second voltage on thesecond plate-line, wherein the second voltage on the second plate-lineis opposite to a first voltage applied to the first capacitor or thethird capacitor via the first plate-line to compensate for dielectriccapacitor dependent charge.
 8. The apparatus of claim 1, wherein thesecond plate-line has a second voltage complementary to a first voltageon the first plate-line.
 9. The apparatus of claim 1, wherein the firstcapacitor, the second capacitor, the third capacitor, and the fourthcapacitor are pillar capacitors or planar capacitors.
 10. The apparatusof claim 1, wherein the first capacitor, the second capacitor, the thirdcapacitor, and the fourth capacitor are vertically stacked.
 11. Theapparatus of claim 1, wherein the non-linear polar material includes oneof: ferroelectric material, paraelectric material, or non-lineardielectric.
 12. An apparatus comprising: an array of bit-cells organizedin rows and columns, wherein an individual bit-cell includes adifferential bit-cell, wherein the differential bit-cell includes firsttwo capacitors with non-linear polar material, and second two capacitorswith linear dielectric, wherein the first two capacitors with thenon-linear polar material are coupled to a first plate-line, and whereinthe second two capacitors with the linear dielectric are coupled to asecond plate-line; and a driver circuitry to drive a first voltage onthe first plate-line and to drive a second voltage on the secondplate-line, wherein the first voltage is an inverse of the secondvoltage.
 13. The apparatus of claim 12, wherein an effective capacitanceof an individual capacitor of the second two capacitors with the lineardielectric is substantially equal to a linear component of a capacitanceof an individual capacitor of the first two capacitors with thenon-linear polar material.
 14. The apparatus of claim 12, wherein thesecond two capacitors with the linear dielectric and the first twocapacitors with the non-linear polar material are planar capacitors orpillar capacitors.
 15. The apparatus of claim 12, wherein the second twocapacitors with the linear dielectric and the first two capacitors withthe non-linear polar material are vertically stacked.
 16. The apparatusof claim 12, wherein the non-linear polar material includes one of:ferroelectric material, paraelectric material, or non-linear dielectric.17. The apparatus of claim 12, wherein the first plate-line and thesecond plate-line are parallel to a bit-line or a word-line.
 18. Asystem comprising: a processor circuitry to execute one or moreinstructions; a memory coupled to the processor circuitry; and acommunication interface to allow the processor circuitry to communicatewith another device, wherein the memory includes a differential bit-cellwhich comprises: a first bit-cell comprising a first transistor coupledto a first bit-line and controllable by a word-line, wherein the firsttransistor is coupled to a first capacitor comprising non-linear polarmaterial, wherein the first transistor is coupled to a second capacitorcomprising dielectric material, wherein the first capacitor is coupledto a first plate-line, and wherein the second capacitor is coupled to asecond plate-line; and a second bit-cell comprising a second transistorcoupled to a second bit-line and controllable by the word-line, whereinthe second transistor is coupled to a third capacitor comprising thenon-linear polar material, wherein the second transistor is coupled to afourth capacitor comprising the dielectric material, wherein the thirdcapacitor is coupled to the first plate-line, and wherein the fourthcapacitor is coupled to the second plate-line.
 19. The system of claim18, wherein an effective capacitance of the second capacitor issubstantially equal to a linear component of a capacitance of the firstcapacitor, and wherein an effective capacitance of the fourth capacitoris substantially equal to a linear component of a capacitance of thethird capacitor.
 20. The system of claim 18 comprising one or morecircuitries to apply a first voltage on the second plate-line, whereinthe first voltage on the second plate-line is opposite to a secondvoltage applied to the first capacitor or the third capacitor via thefirst plate-line to compensate for dielectric capacitor dependentcharge.